| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Tuesday Sessions |
| Session NS-TuP |
| Session: | Poster Session |
| Presenter: | S. Alang Ahmad, University of Sheffield, UK |
| Authors: | S. Alang Ahmad, University of Sheffield, UK L.-S. Wong, University of Manchester, UK E. Haq, University of Sheffield, UK J. Hobbs, University of Sheffield, UK G. Leggett, University of Sheffield, UK J. Micklefield, University of Manchester, UK |
| Correspondent: | Click to Email |
Nanometre scale control of chemical reactivity is key for many applications of nanotechnology in biology, electronics, materials science, etc. Currently there are few methods for the selective initiation of chemical transformations with nanometre precision. Here we report a novel approach to nanopatterning in which a scanning near-field optical microscope coupled to a near-UV laser is used to selectively deprotect 2-nitrophenylpropyloxycarbonyl (NPPOC) protected aminosiloxane monolayers on glass. Initially, UV deprotection was studied for unpatterned samples using X-ray photoelectron spectroscopy and contact angle measurements. The resulting amine-terminated surfaces were activated with glutaraldehyde and then derivatized using a fluorinated adsorbate and aldehyde polymer nanoparticles. Contact angle and XPS measurements indicate extensive surface functionalisation. Next, micrometre-scale patterns were fabricated using mask-based exposure to light from a He-Cd (325 nm) or Ar-ion (364 nm) laser, and characterised by friction force microscopy. Nanoparticle patterns were formed by covalent attachment methods. Nanometre scale patterns were fabricated using near-field exposure, and characterised by FFM. The nanopatterns were derivatised with functionalised molecules, showing that high spatial resolution (ca 100 nm) was readily achievable, and also that extensive functionalisation of the patterns could also be accomplished.