| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Tuesday Sessions |
| Session NS-TuP |
| Session: | Poster Session |
| Presenter: | Y.H. Kim, Furukawa Electric Co. Ltd., Japan |
| Authors: | Y.H. Kim, Furukawa Electric Co. Ltd., Japan B.S. Kim, Massachusetts Institute of Technology P.T. Hammond, Massachusetts Institute of Technology |
| Correspondent: | Click to Email |
A new approach to directly organize colloidal particles into patterned arrays using templates coated with a layer-by-layer assembled polyelectrolyte multilayer was introduced. In this approach, a template using a UV-curable photo polymer was coated with polyelectrolyte multilayers, followed by a contact printing of an oppositely charged polyelectrolyte monolayer. The resultant topological template with both positive and negative charges provided a finely defined chemical nano-pattern to guide selective deposition of colloidal particles onto the patterned surface upon Coulombic attraction. For example, when negatively charged dilute colloidal suspensions were placed on the template, the particles were selectively adsorbed within positively charged grooves or holes. Additionally, we have demonstrated development of uniform PEG copolymer chemical patterns via polymer transfer printing and their applications on direct assembly of two different sets of particles to different surface regions. This effective method provides a flexible and versatile route to the development of composite colloidal structures which will present interesting technological applications in photonics, electronics and sensors.