AVS 55th International Symposium & Exhibition | |
Nanomanufacturing Focus Topic | Wednesday Sessions |
Session NM+PS+AS-WeA |
Session: | Nanomanufacturing I: Plasma Processing and Materials |
Presenter: | L. Dai, National Research Council Canada |
Authors: | L. Dai, National Research Council Canada K. Bosnick, National Research Council Canada |
Correspondent: | Click to Email |
We have successfully produced carbon nanotube (CNT) films (25-50 wafers per load) on a large scale in a commercial Tystar chemical vapor deposition (LPCVD) system. Electron microscopy studies indicate that the CNT films are consisted of densely packed and vertically aligned multi-walled CNTs. A series of catalysts and growth conditions are tested systematically to synthesize high quality CNTs by varying the catalytic metal compounds and the CVD parameters. Both Fe films and ternary metal Cr/Ni/Fe films have been found favorable for the growth of aligned CNT films. To assess the as-grown vertically aligned CNT films, we are developing a general metrology which contains various analytical techniques to qualify the CNT film morphology, size, chirality, homogeneity, purity, dispersion, etc. This metrology uses some of the measurement equipments that are broadly used for material characterizations, including scanning electronic microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy, profilometry, contact angle measurement and thermo gravimetric analysis (TGA). The metrology will facilitate quality control and process optimization necessary for industry applications of CNT films.