| AVS 55th International Symposium & Exhibition | |
| Energy Science and Technology Focus Topic | Tuesday Sessions |
| Session EN-TuP |
| Session: | Energy Focus Topic Poster Session |
| Presenter: | W.K. Yang, Kunsan National University, Korea |
| Authors: | W.K. Yang, Kunsan National University, Korea J.E. Jee, Kunsan National University, Korea J.H. Joo, Kunsan National University, Korea |
| Correspondent: | Click to Email |
Bipolar pulsed magnetron sputtering is used to deposit Al doped ZnO on a glass substrate for a TCO (transparent conducting oxide) in a solar cell structure. A 5”x25” AZO target was sputtered by 50 – 250 kHz bipolar pulsed dc power supply to deposit 400x400mm area by swinging back and forth. Sheet resistance, surface morphology and optical transmittance were measured at 16 slide glasses (1”x3”) to evaluate uniformity. In the thickness of 800nm, the average value of sheet resistance was 37Ω/□ and uniformity was 21.4% in 400×400mm area. The thickness of AZO thin film was 800nm and the resistivity was 2.9×10-3 Ω•cm. Generally, magnetron sputtering plasma is thought to be well confined above a target’s race track. As substrate carrier is swinging, plasma is observed to be severely disrupted to go around to the back side at 5cm of target-substrate distance. To fully address these phenomena, we must use self consistent plasma model incorporating pulsed dc not just a simple dc cathode. As a first approach, we analyzed gas flow using a 3D fluid model as a substrate carrier is moving around a target and a gas distribution pipe. In here, we found that the gas flow distribution affected the plasma. Also we thought that this plasma might affect the deposited thin film. So, we expected that the uniform gas flow distribution could improve the plasma uniformity and the characteristics of AZO thin film.