AVS 55th International Symposium & Exhibition
    Electronic Materials and Processing Tuesday Sessions
       Session EM-TuA

Paper EM-TuA2
Band Edge Engineering of Barium Strontium Titanate Thin Films by Ni-doping Driven Changes in Bonding Symmetry of Ti and O

Tuesday, October 21, 2008, 2:00 pm, Room 210

Session: Complex and Multifunctional Oxides
Presenter: H. Seo, North Carolina State University
Authors: H. Seo, North Carolina State University
Y.B. Kim, Hanyang University, Korea
G. Lucovsky, North Carolina State University
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Suppression of the transition from direct to trap-assisted Fowler-Nordheim tunneling in metal-insulator-metal (MIM) capacitors is reported when approximately one percent Ni-doped barium strontium titanate (BST) thin film dielectrics are substituted for undoped BST. A significant leakage current reduction and improved breakdown resistance are observed for Ni-doped BST compared to undoped BST. The origin of such a large reliability enhancement of Ni-doped BST was investigated by spectroscopic studies includng spectroscopic ellipsometry (SE) and synchrotron X-ray absorption spectroscopy (XAS) measurements. For Ni-doping at the one percent level, the spectral dependence of the imaginary part of the complex dielectric constant,ε2, obtained from SE shows significant differences in the band edge trap depth and density relative to undoped BST revealing defect states 0.2 eV shallower in energy and seven-fold reduced in density. This change in the defect state energy in Ni-doped BST is accompanied by a change in symmetry of the Ti atom empty t2g states from either monoclinic/orthorhombic to tetragonal: the two t2g states higher lying in the undoped BST O K1 edge and spectroscopic ellipsomtery ε2 spectra are merged into to a single state in Ni-doped BST, while preserving the average t2g d-state energy. The physical origin of these changes in the band edge defects is the substitution of divalent Ni2+ for tetravalent Ti4+ in band edge divacancy defects. Electrical measurements of J-V traces for Ni-doped BST show a symmetric direct tunneling process while undoped BST revealed asymmetric trap assistant tunneling/Fowler-Nordheim conduction process responsible for a rapid current rise. The results on improved Ni-doped BST suggest an approach for BST MIM capacitor in gigabit dynamic random access memory as well as identify a novel band edge state engineering approach based on transition metal doping which should be applied to other oxides with perovskite structures, e.g., PbTiO3 and PbZrO3.