AVS 55th International Symposium & Exhibition | |
Electronic Materials and Processing | Tuesday Sessions |
Session EM-TuA |
Session: | Complex and Multifunctional Oxides |
Presenter: | C.R. Aita, University of Wisconsin-Milwaukee |
Authors: | C.R. Aita, University of Wisconsin-Milwaukee E.E. Hoppe, University of Wisconsin-Milwaukee M.C. Cisneros-Morales, University of Wisconsin-Milwaukee |
Correspondent: | Click to Email |
The formation of metastable nanocrystalline phases during reactive sputter deposition of HfO2-Al2O3, HfO2-ZrO2, and HfO2-TiO2 nanolaminates on unheated substrates is discussed. In addition to being technologically useful, these nanolaminates are archetypical because their bulk pseudobinary phase diagrams predict three different modes of interfacial mixing: complete immiscibility (HfO2-Al2O3), complete miscibility (HfO2-ZrO2) and limited miscibility without a common end-member lattice (HfO2-TiO2). Of these individual constituents, all but Al2O3 (which has structural complexity) form both intralayer and interfacial nanocrystalline phases. However, these are often not bulk equilibrium phases and are termed here metastable. This paper addresses two questions: (1) By what mechanisms do these metastable phases arise? (2) How thermally stable are they at temperatures that a device may see during routine processing? We discuss metastable phases resulting from finite crystal size effects (tetragonal and orthorhombic HfO2 in HfO2-Al2O3) and heteroepitaxy (tetragonal Hf1-xZrxO2 in HfO2-ZrO2). We discuss the formation of a complex interface in HfO2-TiO2 nanolaminates that includes monoclinic Hf1-xTixO2, a metastable phase which here results from a second order phase transition of orthorhombic HfTiO2 (a stable interfacial phase) to accommodate the larger Hf atom at aHfO2-on-TiO2 interface. In all cases, these metastable structures represent self-assembly into the lowest possible energy structures in the absence of long-range diffusion.