AVS 55th International Symposium & Exhibition
    Biological, Organic, and Soft Materials Focus Topic Friday Sessions
       Session BO+SS+AS-FrM

Paper BO+SS+AS-FrM9
Morphology and Bonding in Alkene and Alkyne Based Monolayers Chemomechanically Formed on Si Surfaces

Friday, October 24, 2008, 11:00 am, Room 201

Session: Self Assembled Ultrathin Organic Interfaces
Presenter: T.M. Willey, Lawrence Livermore National Laboratory
Authors: T.M. Willey, Lawrence Livermore National Laboratory
M.V. Lee, Materials Nanoarchitectonics, Japan
J.R.I. Lee, Lawrence Livermore National Laboratory
M.R. Linford, Brigham Young University
Correspondent: Click to Email

One of the most simple and economical methods for attaching and patterning alkenes or alkynes on silicon surfaces is through chemomechanical modification. Scribing the Si removes the oxide passivation layer, allowing the alkene or alkyne to chemisorb to the exposed and highly reactive Si surface. Near-edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy reveals chemically homogeneous films with nearly monolayer coverage. Both alkene and alkyne precursors show no orientational order; however, more rigid perfluoronated molecules do have some incident angle dependence in NEXAFS resonances. Both alkenes and alkynes retain significant sp/sp2 content. Hypothesized mechanisms of chemisorption are presented based on comparing the intensity of the sp/sp2 features in the NEXAFS acquired from monolayers to measurements of precursor alkenes and alkynes in the gas-phase.