AVS 55th International Symposium & Exhibition
    Biomaterial Interfaces Thursday Sessions
       Session BI+NC-ThM

Paper BI+NC-ThM12
Patterning of Plasma Polymers for Bioarray

Thursday, October 23, 2008, 11:40 am, Room 202

Session: Engineering Biointerfaces
Presenter: G. Mishra, University of Sheffield, UK
Authors: G. Mishra, University of Sheffield, UK
S.L. McArthur, University of Sheffield, UK
Correspondent: Click to Email

The high-density, multi-anaylate chips required for genomic and proteomic research can be successfully produced using a precise surface patterning methodology that allows controlled positioning of chemically distinct active areas. A major challenge with current bio-sensing devices which requires addressing is the need for surface chemistry that allows immobilised biomolecules of diverse types to retain their biological activity. Plasma polymerisation presents a versatile approach to surface modification of these devices. The range of monomers available for plasma polymerisation makes this manufacturing approach even more suitable for use in systems where multiple coatings with specific properties are required for a single device. The control offered by this surface modification technique and the ability to spatially define reactive regions to reduce non-specific background adsorption is integral to this project. This study highlights the efficacy of photolithographic plasma polymer patterning and provides a rare insight into issues associated with achievable chemical specificity and spatial resolution. A multi-technique investigation (XPS, ToF-SIMS, AFM, fluorescence microscopy) of surface chemistry and its biological response forms the focus of the study. Using ToF-SIMS data and multivariate analysis, we highlight the intricacies of pulsed plasma polymerised surface chemistry and propose a unique approach to optimising these parameters in order to maximise functional group retention. ToF-SIMS data has also been used to provide new insight into the mechanism of pulsed plasma polymerisation.