AVS 54th International Symposium | |
Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:40am | TF-MoM3 Invited Paper Conformal Polymeric Thin Films via Initiated Chemical Vapor Deposition S.H. Baxamusa, M. Gupta, K.K. Gleason, Massachusetts Institute of Technology |
9:20am | TF-MoM5 Nanolaminate Gas Diffusion Barriers on Polymers with Exceptionally Low H2O Permeabilities A.A. Dameron, S.M. George, University of Colorado at Boulder, P.F. Carcia, R.S. McLean, DuPont Research and Development |
9:40am | TF-MoM6 Atomic Layer Deposition for Passivation and Corrosion Protection of Metal Substrates S.I. Sneck, Beneq, Finland |
10:20am | TF-MoM8 Invited Paper Combinatorial Atomic Layer Deposition of Nanolaminates W.L. Gladfelter, T. Moersch, L. Zhong, B. Luo, University of Minnesota |
11:00am | TF-MoM10 Combinatorial Strategy to Address the Complexities of Surface Chemistry and Multicomponent Materials in Atomic Layer Deposition L. Henn-Lecordier, E. Robertson, P. Banerjee, G.W. Rubloff, University of Maryland |
11:20am | TF-MoM11 Physical and Electrical Characteristics of ZrxHf1-xOy Films Deposited by Atomic Layer Deposition Method S. Bang, S. Lee, S. Jeon, S. Kwon, W. Jeong, I. Kim, H. Jeon, Hanyang University, Korea |
11:40am | TF-MoM12 An ALD Growth Study of ZrO2 on Si(100) P.J. Evans, G. Traini, J. Murison, M.J.Y. Tayebjee, N. Loh, D.-H. Yu, A.P.J. Stampfl, Australian Nuclear Science and Technology Organisation, T.-W. Pi, National Synchrotron Radiation Research Center, Taiwan |