AVS 54th International Symposium
    Vacuum Technology Wednesday Sessions
       Session VT-WeA

Invited Paper VT-WeA8
The Role of Vacuum-Based Processes in Developing High Performance Chemical Microsensors

Wednesday, October 17, 2007, 4:00 pm, Room 618

Session: Miniature, Portable and Space Vacuum Applications
Presenter: S. Semancik, National Institute of Standards and Technology
Authors: S. Semancik, National Institute of Standards and Technology
D.C. Meier, National Institute of Standards and Technology
J.K. Evju, National Institute of Standards and Technology
M.J. Carrier, National Institute of Standards and Technology
C.B. Montgomery, National Institute of Standards and Technology
K. Newcomb, M.I.T. Lincoln Laboratory
C.L. Keast, M.I.T. Lincoln Laboratory
Correspondent: Click to Email

There is a growing demand for solid state chemical microsensors that are capable of analyzing gas phase compositions encountered in a wide range of application areas, from process control to space exploration and health care. In certain cases these small sensing devices would be used instead of more expensive and cumbersome instrumentation, and in others they would enable chemical monitoring within dispersed multipoint networks which are not amenable to instrument-based measurements. While the necessary detection characteristics vary with application, the defense/homeland security sector provides what are arguably some of the most demanding performance requirements for such microsensors: rapid detection; sensitivities to hazards such as chemical warfare agents (CWAs) and toxic industrial chemicals (TICs) at nmol/mol (ppb) and even pmol/mol (ppt) concentrations; reliability and robustness to avoid false target readings in practical backgrounds; and, extended lifetimes. This presentation will focus on vacuum-based processing and vacuum-related phenomena that enable the fabrication and evaluation of MEMS-based, chemiresistive microsensor array devices being developed for detection of low level chemical hazards in air-based backgrounds (including interference compounds). Microarray device platforms (1000s of devices on 6 inch wafers) are fabricated at a silicon foundry through a multi-step processing schedule including nearly two dozen controlled vacuum procedures (e. g. - etching, CVD, PVD). The incorporation of nanostructured sensing materials onto the ~ 100 µm (microhotplate) array elements of our devices is achieved using a variety of methods, including thermally activated, self-lithographic CVD (at 3 Pa), and an ion etch pre-process (at ~ 10-5 Pa base pressure) has been shown to produce good sensing material contact to the microdevice electrodes, which is critical for attaining high sensitivity and reliable operation. In addition, vacuum phenomena come into play while evaluating the microarray sensors, since very low concentrations of target analytes (often with low vapor pressures) must be injected into air-based backgrounds and delivered to a device exposure point within our testing system. Technical aspects (enhanced analytical content for species recognition, redundant elements, etc.) that have allowed us to achieve sub-ppb CWA simulant detection with our microsensors will be discussed.