| AVS 54th International Symposium | |
| Thin Film | Tuesday Sessions |
| Session TF-TuP |
| Session: | Aspects of Thin Films Poster Session |
| Presenter: | S.M. Park, Sungkyunkwan University, Korea |
| Authors: | S.M. Park, Sungkyunkwan University, Korea Y.B. Yun, Sungkyunkwan University, Korea D.J. Kim, Sungkyunkwan University, Korea N.-E. Lee, Sungkyunkwan University, Korea |
| Correspondent: | Click to Email |
Recently, transparent barrier coatings on polymer substrate have received much attention for liquid crystal displays, organic light-emitting-diode (OLEDs) displays, solar modules, and food packing applications. In this work, SiOxNy and methylcyclohexane (MCH) plasma polymer films as transparent diffusion barrier coating were deposited by a low temperature plasma enhanced chemical vapor deposition (PECVD) on polyether sulfone (PES) substrate using hexamethyldisilazane (HMDSN)/N2O/O2/Ar gas and methylcyclohexane/Ar gas mixtures, respectively. Effects of source flow rates, plasma power and chamber pressure were investigated. The deposition rate, chemical bonding states, transparency, surface morphology and WVTR were characterized by FE-SEM, fourier transform-infrared (FT-IR) spectroscopy, UV-visible, atomic force microscope (AFM) and permeability measurement system. Multilayer structures were also fabricated in one PECVD system. Transparent multilayer of SiOxNy/plasma polymer with the optical transparency larger than 90%.