AVS 54th International Symposium
    Surface Science Friday Sessions
       Session SS2+EM+TF-FrM

Invited Paper SS2+EM+TF-FrM3
A Nanoengineering Approach to Regulate The Lateral Heterogeneity of Self-Assembled Monolayers

Friday, October 19, 2007, 8:40 am, Room 611

Session: Organic Films II: Semiconductors and C@sub 60@
Presenter: G.-Y. Liu, University of California, Davis
Authors: J.-J. Yu, University of California, Davis
Y.H. Tan, University of California, Davis
X. Li, University of California, Davis
P.K. Kuo, Wayne State University
G.-Y. Liu, University of California, Davis
Correspondent: Click to Email

Using a scanning probe lithography method known as nanografting in conjunction with knowledge of self-assembly chemistry, regulation of the heterogeneity of self-assembled monolayers (SAMs) is demonstrated. It is known that phase segregated domains would form if SAMs are grown from thiol solutions of mixed compositions. The size and distribution of these domains depend on the interplay between reaction kinetics and dynamics, which can be regulated by varying the reaction conditions including concentration, temperature and reaction time. The reaction mechanism in nanografting, however, differs significantly from self-assembly in the conventional mix-and-grow methods. The spatial confinement in nanografting bypasses the lying-down to standing up transition process, and thus leads to a much fast kinetics. Knowledge of the reaction pathways enables development of methods for shifting the interplay between the kinetics and thermodynamics in SAM formation, and thus the heterogeneity of mixed SAMs. By varying fabrication parameters such as shaving speed, and reaction conditions such as concentration and ratio of the components, the lateral heterogeneity can be adjusted ranging from near molecular mixing to segregated domains of several to tens of nanometers.