AVS 54th International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP8
Wettability and Chemical Bonding of Water and Hydroxyl at Metal Surfaces

Tuesday, October 16, 2007, 6:00 pm, Room 4C

Session: Surface Science Poster Session
Presenter: T. Schiros, Stanford Synchrotron Radiation Laboratory
Authors: T. Schiros, Stanford Synchrotron Radiation Laboratory
O. Takahashi, Hiroshima University, Japan
K. Andersson, DTU/Center for Individual Nanoparticle Functions, Denmark
H. Öström, Stockholm University, Sweden
S. Yamamoto, Stanford Synchrotron Radiation Laboratory
L.-Å Näslund, Stanford Synchrotron Radiation Laboratory
L.G.M. Pettersson, Stockholm University, Sweden
A. Nilsson, Stanford Synchrotron Radiation Laboratory
H. Ogasawara, Stanford Synchrotron Radiation Laboratory
Correspondent: Click to Email

The nature of the chemical bonding and structure of water and water co-adsorbed with hydroxyl at metal surfaces is of immense relevance to a number of important reactions in heterogeneous catalysis, including the water gas shift reaction over Cu and the fuel cell reaction over Pt and related alloys. We have combined core level x-ray spectroscopy, in both UHV and near-ambient conditions, with density functional theory to derive a detailed picture and comparison of the interaction of water and water plus hydroxyl with different metal surfaces, including Cu(110), Cu(111) and Pt(111). We demonstrate that the ability to form water-metal bonds, or wettability, is controlled by the degree of Pauli repulsion, which is influenced by both the electronic and geometric structure of substrates. At near ambient conditions, formation of OH groups by pre-adsorbed oxygen significantly modifies the ability to form water-metal bonds and plays a decisive role in the wetting of metal surfaces.