AVS 54th International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP39
Growth and Physical Properties of Epitaxial Metastable Hf1-xAlxN Alloys Deposited on MgO(001) by Ultrahigh Vacuum Reactive Magnetron Sputtering

Tuesday, October 16, 2007, 6:00 pm, Room 4C

Session: Surface Science Poster Session
Presenter: B.M. Howe, University of Illinois at Urbana-Champaign
Authors: B.M. Howe, University of Illinois at Urbana-Champaign
J. Bareño, University of Illinois at Urbana-Champaign
M. Stoehr, Université de Haute Alsace, France
M. Sardela, University of Illinois at Urbana-Champaign
J.G. Wen, University of Illinois at Urbana-Champaign
J.E. Greene, University of Illinois at Urbana-Champaign
L. Hultman, Linköping University, Sweden
A.A. Voevodin, Air Force Research Laboratory
I. Petrov, University of Illinois at Urbana-Champaign
Correspondent: Click to Email

Epitaxial metastable Hf1-xAlxN alloys with 0 = x = 0.50 were grown on MgO(001)substrates at 600°C by ultrahigh vacuum reactive magnetron sputtering from Hf and Al targets in 90 % Ar + 10 % N2 discharges at 7 mTorr. X-Ray diffraction and crosssectional transmission electron microscopy show that Hf1-xAlxN alloys are single crystals with the B1-NaCl structure. Rutherford backscattering spectroscopy investigations reveal that all films are slightly overstochiometric with N/(Hf+Al) = 1.05 ± 0.05. The relaxed lattice parameter decreased linearly from 0.4519 nm with x = 0 to 0.4438 nm with x = 0.50, compared to 0.4320 nm expected from the linear Vegard’s rule. We find a metastable single phase field that is remarkably broad given the large lattice mismatch (~ 9 %) between the two alloy components. Alloying HfN with AlN leads to an increase in hardness (~ 30% to 32.4 ± 0.7 GPa), as well as nanostructured compositional modulations due to the onset of spinodal decomposition.