| AVS 54th International Symposium | |
| Surface Science | Thursday Sessions |
| Session SS-ThP |
| Session: | Surface Science Poster Session |
| Presenter: | B. Forster, Bradley University |
| Authors: | B. Forster, Bradley University S. Yeninas, Bradley University J. Thompson, Bradley University J.H. Craig, Jr., Bradley University J. Lozano, Bradley University |
| Correspondent: | Click to Email |
We have used several surface analysis techniques to study the adsorption dissociation, and desorption of monoethylamine (MEA) on Si(100) surfaces. Thermal processes were studied using high resolution electron energy loss spectroscopy (HREELS) and temperature programmed desorption (TPD). Non-thermal processes using electron irradiation of MEA/Si(100) at 100 K were studied using HREELS TPD, x-ray photoelectron spectroscopy (XPS), and electron stimulated desorption (ESD). Our data indicated low temperature electron-induced dissociation of MEA, deposition of nitrogen, and formation of silicon nitride.