| AVS 54th International Symposium | |
| Surface Science | Thursday Sessions |
| Session SS-ThP |
| Session: | Surface Science Poster Session |
| Presenter: | B. Bush, Bradley University |
| Authors: | B. Bush, Bradley University A. Marquis, Bradley University O. Egwu, Bradley University J.H. Craig, Bradley University K. Roos, Bradley University J. Lozano, Bradley University |
| Correspondent: | Click to Email |
Trisilylamine (SiH3)3N is the silicon analog to the carbon-containing molecular species trimethylamine (CH3)3N. The fundamental structural difference between these amines is the planar backbone exhibited by TSA. The Si3N backbone is the same structure which occurs in silicon nitride Si3N4. Little fundamental work has been reported on the adsorption properties of TSA on the Si(100) surface. We report on the results of a series of adsorption studies of TSA on the Si(100) surface at 100K using XPS, UPS, HREELS, and TPS to elucidate the dissociation pathways and bonding of the TSA molecule on the surface. Results of electron bombardment studies to remove hydrogen ligands from the adsorbed species will also be discussed. Preliminary STM images of very low coverage adsorption of TSA on the Si(100) surface will also be presented and discussed.