AVS 54th International Symposium
    Advanced Surface Engineering Tuesday Sessions
       Session SE-TuP

Paper SE-TuP6
Preparation of TiO2 Thin Films by Laser Ablation for Photocatalytic Applications

Tuesday, October 16, 2007, 6:00 pm, Room 4C

Session: Advanced Surface Engineering Poster Session
Presenter: J.-Y. Ciou, National Dong Hwa University, Taiwan
Authors: W.-T. Chang, National Dong Hwa University, Taiwan
J.-Y. Ciou, National Dong Hwa University, Taiwan
S.-J. Wang, National Taipei University of Technology, Taiwan
M.-K. Wei, National Dong Hwa University, Taiwan
M.S. Wong, National Dong Hwa University, Taiwan
Correspondent: Click to Email

Thin titanium dioxide (TiO2) films were deposited by KrF excimer laser ablation deposition system using a titanium oxide target. The effects of substrate temperature and oxygen partial pressure on the phase formations of various microstructures were investigated by X-Ray diffraction (XRD), scanning electron microscopy (SEM), Raman scattering spectroscopy and UV-Vis spectrophotometer, respectively. Increasing the substrate temperature can improve the quality of anatase phase of crystalline TiO2 films that were obtained from the amorphous structure hybridized with rutile and anatase phases. However, the oxygen pressure in the range between 15 to 60 mTorr shows a single anatase phase in TiO2 films that the rutile and anatase phases were observed elsewhere. The bandgap of TiO2 films varied from 2.72eV to 3.27 eV with more oxygen partial pressure in the film deposition indicates the phase changed from rutile phase to anatase phase. The surface area of TiO2 films was increased as more oxygen partial pressure involved in the fabrication. The photocatalytic effect measured by exposing the methylene blue in UV light that was distinguishable in the TiO2 films with high anatase phases and surface area.