| AVS 54th International Symposium | |
| Advanced Surface Engineering | Monday Sessions |
| Session SE-MoM |
| Session: | Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties |
| Presenter: | Y.-Y. Chang, Mingdao University, Taiwan |
| Authors: | Y.-Y. Chang, Mingdao University, Taiwan C.-P. Chang, Mingdao University, Taiwan S.-M. Yang, National Chung Hsing University, Taiwan D.-Y. Wang, Mingdao University, Taiwan W. Wu, National Chung Hsing University, Taiwan |
| Correspondent: | Click to Email |
Binary CrN and ternary TiAlN coatings attracted considerable industrial interest, because of their excellent tribological performance and high oxidation resistance at high temperature. Recently, TiAlSiN and CrAlSiN coatings have been developed in order to possess high hardness and good chemical stability at temperature exceeding 1000 oC. These properties are very important in developing new generation superhard and wear-resistant coatings for high speed and dry machining applications. In this study, a series of CrN, TiAlN, TiAlSiN and CrAlSiN coatings were deposited onto silicon substrate by a cathodic arc evaporation system using a lateral rotating arc source. Owing to the different oxidation behavior and decomposition of CrN, TiAlN, TiAlSiN and CrAlSiN coatings, the as-deposited films were annealed at 900 oC and 1100 oC in air atmosphere for duration of 2 hours. During the annealing process, Ti, Al, and Si would diffusion outward to form the oxidative layers of Al2O3, TiO2, and SiO2 or others at high temperature. Cr, Al, and Si would diffusion outward to form the oxidative layers of Al2O3, Cr2O3, and SiO2 or others at high temperature. Therefore, the mechanical property varied with the phase segregation via heat-treatment caused the deposited films destruction. The correlation between oxidative layer and the deposited films will be discussed. The chemical depth profile of the deposited coatings was determined by Secondary Ion Mass Spectrometry (SIMS). X-ray diffractometry was performed using PANalytical X’pert Pro diffractometer with a high resolution ? goniometer and Cu radiation in both glancing angle and high-angle configurations for phase identification. The microstructure was investigated by field emission gun high resolution transmission electron microscopy (FEG-HRTEM, FEI Tecnai G2 20 S-Twin) equipped with an energy-dispersive x-ray analysis spectrometer (EDS), operated at 200 keV for high-resolution imaging.