| AVS 54th International Symposium | |
| Nanometer-scale Science and Technology | Thursday Sessions |
| Session NS-ThP |
| Session: | Nanometer-Scale Science & Techology Poster Session II |
| Presenter: | M. Lu, Argonne National Laboratory |
| Authors: | M. Lu, Argonne National Laboratory L.E. Ocola, Argonne National Laboratory S. Gray, Argonne National Laboratory G. Wiederrecht, Argonne National Laboratory |
| Correspondent: | Click to Email |
Conceptual plasmonic devices show promising potential in transmitting and processing light at deep sub-wavelength scale.1 The design and fabrication of a 100-nm-wide hybrid light-bending waveguide structure is discussed. Numerical modelling using finite-difference time-domain (FDTD) algorithm shows the device has an efficient confinement that is capable of transmitting light around 90 degree corners with minimal loss (<10%). The waveguide core is made by electron beam lithography and reactive ion etching with a bilayer resist. Sharp inner corners, which is important for low loss light bending, are achieved by an effective proximity correction (PEC) during e-beam lithography. The 800-nm-thick metal cladding is then formed by a selective electroplating. The wave guide is designed for near-field scanning optical microscope (NSOM) characterization, by leaving open the top of the waveguide. Achievement of this waveguide will enable submicron optical devices without the need of photonic crystals.
1T-W. Lee and S. K. Gray, Optics Express, 13, 9652-9659 (2005).