AVS 54th International Symposium
    Nanomanufacturing Topical Conference Wednesday Sessions
       Session NM-WeM

Invited Paper NM-WeM11
Nano-fabrication of Patterned Media

Wednesday, October 17, 2007, 11:20 am, Room 615

Session: Nanomanufacturing for Information Technologies
Presenter: T.-W. Wu, Hitachi Global Storage Technologies
Authors: T.-W. Wu, Hitachi Global Storage Technologies
M. Best, Hitachi Global Storage Technologies
D. Kercher, Hitachi Global Storage Technologies
E. Dobisz, Hitachi Global Storage Technologies
Z.Z. Bandic, Hitachi Global Storage Technologies
X.C. Guo, Hitachi Global Storage Technologies
M. Mate, Hitachi Global Storage Technologies
T. Karis, Hitachi Global Storage Technologies
H. Yang, Hitachi Global Storage Technologies
T. Albrecht, Hitachi Global Storage Technologies
Correspondent: Click to Email

The outlook of magnetic storage technology predicts that, with current 40% growth rate, the recording areal density will hit ~700 Gbits/in2 in 2011. However, the magnetic recording physics also predicts that perpendicular magnetic recording (PMR) media will hit the thermal instability limit as the grain size of the magnetic coating scaled down below ~5nm in diameter. Because patterned media (PM) leverages the geometric decoupling magnetic exchange, a magnetic material even with ultra-small (e.g. d<5nm) but strong magnetically coupled grains can still be utilized to constitute the required recording bit (d=10~15nm) and avoid the thermal instability. Furthermore, because of its geometrically defined bit border, PM can achieve both higher track and linear densities than does the continuous media and hence boost the areal density. As a disruptive magnetic recording technology, PM is viewed as one of the most promising routes to extending magnetic data recording to densities of 1 Tbit/in2 and beyond. The fabrication of PM disk starts with the imprint master mold creation followed by pattern replication by nano-imprinting, pattern transfer by reactive ion etch and finished with blank deposition of a magnetic coating. The key challenges in the PM substrate fabrication are how to create those nano-scaled features (e.g. pillars with 20nm in diameter) with acceptable fidelity? How to create them with an incredibly high density (e.g. a square lattice with less than 40nm in period) in a very large area (e.g. ~2 square inches) and also within a reasonable time frame? How to inspect them with a reasonable statistics basis? In addition, those features need to be arranged in a circular array and have a very stringent long range order as well. Although the physical feasibility at each critical stage has been demonstrated to a degree in the recent years, to ensure a manufacturing feasibility for the production of patterned disk substrates, the process robustness and reliability, parts longevity, high throughput tooling and low cost operation, etc. are still far from completion and remain as immense challenges. In order to achieve the goal of PM hard disk drive (HDD) production in 2011 time frame, many scientific innovations and technology advances, such as the r-θ ebeam machine, guided self-assembly patterning, double-side high throughput imprinting and RIE, etc. are critically needed.