Paper EW-TuL3
Commercially Available High-Throughput Dip Pen Nanolithography®

Tuesday, October 16, 2007, 1:00 pm, Room Exhibit Hall

Dip Pen Nanolithography® (DPN®) is an inherently additive SPM-based technique which operates under ambient conditions, making it suitable to deposit wide range of biological, organic, and inorganic materials. Further, massively parallel two-dimensional nanopatterning with DPN is now commercially available via NanoInk’s 2D nano PrintArray^TM, making DPN a high-throughput, flexible and versatile method for precision nanoscale pattern formation. By fabricating 55,000 cantilevers (each with its own nanoscale tip) across a 1 cm² chip, we leverage the inherent versatility of DPN and demonstrate large area surface coverage, routinely achieving throughputs of 3x10⁷ μm² per hour.