AVS 54th International Symposium
    Electronic Materials and Processing Tuesday Sessions
       Session EM+NS-TuA

Paper EM+NS-TuA5
Zinc Oxide Nanowalls and its Optical and Field Emission Properties

Tuesday, October 16, 2007, 3:00 pm, Room 612

Session: Semiconductor Nanostructures for Electronics and Optoelectronics II
Presenter: K.T. Leung, University of Waterloo, Canada
Authors: D. Pradhan, University of Waterloo, Canada
K.T. Leung, University of Waterloo, Canada
Correspondent: Click to Email

Vertically grown ZnO nanowalls, with typical dimensions of 40-80 nm thick and several micrometers wide, were electrodeposited on an ITO-glass substrate at 70 °C. XRD study shows that these nanowalls have the wurtzite structure and are highly crystalline. The corresponding Raman and photoluminescence spectra further indicate the presence of oxygen deficiency. These ZnO nanowalls exhibit excellent field emission performance, with not only a considerably lower turn-on field of 3.6 V/μm (at 0.1 μA/cm2) but also a higher current density of 0.34 mA/cm2 at 6.6 V/μm than most of ZnO nanowires and other one-dimensional nanostructures reported to date. We will also discuss a plausible growth mechanism for these nanowalls, and our recent work on the growth of these and other novel ZnO two-dimensional nanostructures on ITO-plastics.