AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP25
Conduction Anisotropy in Nanostructured Titanium Films

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: D.W. Vick, University of Alberta, Canada
Authors: D.W. Vick, University of Alberta, Canada
M.J. Brett, University of Alberta, Canada
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Considerable control over the microstructure of evaporated thin films has been demonstrated using dynamic control of the vapour incident angle (@alpha@) and the azimuthal orientation of the substrate during the deposition process.@footnote 1@ In the present study, advanced substrate motion is used to engineer the electrical properties of metallic films, and an attempt is made to relate measured electrical conductivity with observed film microstructure. Films with and without structural anisotropy will be included in the study. The regime of glancing angle deposition (GLAD) conditions (@alpha@ @>=@ 80°) is of particular interest to us. Under such conditions, significant voiding in the films results in a microstructure of isolated metallic islands whose mean size, shape, and separation are to some extent controllable. The experimental films consist of layers of Ti (nominal thickness 200 nm) deposited over barrier layers of SiO@sub 2@. Standard lithographic techniques are used to create arc-shaped tracks of 1 mm width, in a manner similar to that reported by Kuwahara and Hirota.@footnote 2@ Metalization contacts and bonded wires are then added to the wafers, permitting measurement of electrical conductivity of the films and determination of the conduction anisotropy in the plane of the films. Preliminary results show that the ratio of conductivities along the two principal directions in the films can easily exceed a value of 7. Scanning electron microscope images that reveal the microstructure of the films will be presented together with conductivity measurements. Experimental results will be compared with the predictions of standard models of electrical conduction in discontinuous media. @FootnoteText@ @footnote 1@ K. Robbie, J. C. Sit, and M. J. Brett, J. Vac. Sci. Technol. B 16, 1115 (1998). @Footnote 2@ K. Kuwahara and H. Hirota, Jap. J. Appl. Phys. 13, 1093 (1974).