AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP21
Gas Barrier Properties of the Composite Films Consisting of SiO2 and SnO2

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: W.H. Koo, Yonsei University, Korea
Authors: W.H. Koo, Yonsei University, Korea
S.M. Jeong, Yonsei University, Korea
S.H. Choi, Yonsei University, Korea
H.K. Baik, Yonsei University, Korea
S.M. Lee, Kangwon National University, Korea
S.J. Lee, Kyungsung University, Korea
Correspondent: Click to Email
Composite thin films consisting of silicon oxide and tin oxide have been deposited on polycarbonate substrates as gas barrier films, using a thermal evaporation process in oxygen gas environment. Water vapor permeation through gas barrier films are significantly affected by the chemical interaction of water vapor with oxide films and the microstructure of the oxide films. The chemical interaction of water vapor with oxide films has been investigated by the refractive index from ellipsometry and OH group peak from x-ray photoelectron spectroscopy, and the microstructure of the composite oxide films characterized using x-ray diffraction, atomic force microscopy and transmission electron microscopy. As the tin oxide is added to the silicon oxide, the refractive index and OH group peak intensity of the composite films increase, and water vapor transmission rate through the composite oxide films shows the lower value than that through the sigle element oxide films such as tin oxide and silicon oxide. The results are discussed in terms of the chemical interaction with water vapor and microstructure of the oxide films.