AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP14
Cathodic Vacuum Arc Deposition of MgO Thin Films on the Large Area Glass Substrate

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: L. Sunghun, Korea Institute of Machinery and Materials, Korea
Authors: L. Sunghun, Korea Institute of Machinery and Materials, Korea
B. Sung-Kyu, Korea Institute of Machinery and Materials, Korea
K. Jong-Kuk, Korea Institute of Machinery and Materials, Korea
L. Gun-Hwan, Korea Institute of Machinery and Materials, Korea
Correspondent: Click to Email
It is well known that MgO film is used as the protective layer in AC-plasma display panels(AC-PDPs). Until now, e-beam evaporation and reactive magnetron sputtering method has been mainly adopted to produce MgO protective layer over the electrodes on the front glass panel of the PDP. However, there are still some problems such as the higher sputtering rate at e-beam method and the lower growth rate at magnetron sputtering method. In this work, cathodic vacuum arc deposition was introduced to produce MgO films on large area glass substrate, which shows higher deposition rates and the large number of ionized particles and high ion energy. Magnesium was used as a source material and oxygen was introduced as a reactive gas. We have investigated (1) appropriate shape of target for large area coating with one rectangular Mg target with size of 300 x 90 mm and two circular Mg target with diameter of 75 mm and (2) stable arc operating condition such as arrangement of magnet, magnet field strength, arc current and introduction method of oxygen gas. It was concluded that the rectangular type is not suitable for large area coating because of it's low mass utilization efficiency and the stable arc operating condition for circular Mg target . A properly designed arc source module with multiple circular Mg target for MgO protective layer with good quality will be presented.