AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoA

Paper TF-MoA5
Properties and Applications of Boron Carbide Thin Films

Monday, November 15, 2004, 3:20 pm, Room 303C

Session: Mechanical Properties of Thin Films
Presenter: Y. Chen, Northwestern University
Authors: Y. Chen, Northwestern University
C.A. Freyman, Northwestern University
Y.-W. Chung, Northwestern University
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Boron carbide thin films have been synthesized with pulsed dc magnetron sputtering using a boron carbide target in an ambient of pure argon. We examined the effect of substrate bias and pressure on the surface roughness and hardness of these films. Wear rates and coefficient of friction data were also obtained. As expected, an optimum substrate bias results in the atomic scale surface topography and highest nanoindentation hardness (about 40 GPa). Under normal ambient conditions, boron carbide films result in lower friction coefficient, most likely due to the formation of boric acid as a solid lubricant, reported earlier by Erdemir and coworkers. The high hardness, smooth topography and low friction even in moist environments suggest that boron carbide may be a better protective overcoat for disk drive systems.