AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoA

Invited Paper TF-MoA3
A Nanometrics Feasibility Approach to Reliable Devices

Monday, November 15, 2004, 2:40 pm, Room 303C

Session: Mechanical Properties of Thin Films
Presenter: W.W. Gerberich, University of Minnesota
Authors: W.W. Gerberich, University of Minnesota
W.M. Mook, University of Minnesota
J.M. Jungk, University of Minnesota
M.J. Cordill, University of Minnesota
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Rapid advances in LIGA structures and other approaches to MEMS devices could be achieved by fast turn-around screening. This could be achieved on appropriate length-scale test samples fabricated by MBE (molecular beam epitaxy), CVD (chemical vapor deposition), ALD (atomic layer deposition), and electrochemically-produced small volumes. Using nanoindenters as either indenters or compression testers, we have already demonstrated that films, nanospheres, and thin-walled nanoboxes of Au, Ti and Si can exhibit three or four levels of length scale.@footnote 1@ These and further developments regarding possible computational and combinational approaches will be discussed. @FootnoteText@ @footnote 1@W.M. Mook, "Geometry and Surface State Effects on the Mechanical Response of Au Nanostructures," Zeiss Metalkunde (2004) in press.