AVS 51st International Symposium
    Surface Science Monday Sessions
       Session SS2-MoM

Paper SS2-MoM5
Adsorption of Amines on Germanium and Silicon Surfaces

Monday, November 15, 2004, 9:40 am, Room 210C

Session: Functionalization of Semiconductor Surfaces
Presenter: C.M. Greenlief, University of Missouri-Columbia
Authors: P. Prayongpan, University of Missouri-Columbia
C.M. Greenlief, University of Missouri-Columbia
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The bonding and structure of organic molecules with semiconductor surfaces is important for a variety of potential applications. This work examines the interactions between small organic molecules; ethylamine and allylamine, with Si(100)-2x1 and Ge(100)-2x1 surfaces. Ab initio calculations are used to investigate the transition states and predicted adsorption products for the reactions between the organic molecules and a dimer cluster model of the semiconductor surfaces. The cluster models include Si@sub 9@H@sub 12@, Ge@sub 9@H@sub 12@, and a mixed cluster; Ge@sub 2@Si@sub 7@H@sub 12@. Ultraviolet and x-ray photoelectron spectroscopy are used to examine the chemical bonding of the adsorbed products. This work will examine the effect of electron donating organic molecules with semiconductor surfaces. The selectivity and reactivity of functional groups in the surfaces will be described. According to our recent experimental and theoretical studies, the adsorption products for the interaction between amine molecules with Si(100)-2x1 and Ge(100)-2x1 surfaces are temperature dependent. Low temperature adsorption favors dative bonding of the amine with either surface, whereas different adsorption geometries are observed for adsorption at higher surface temperatures.