AVS 51st International Symposium
    Surface Science Monday Sessions
       Session SS-MoP

Paper SS-MoP8
Wetting Behavior of Liquids and Polymer Solutions on the Micro-patterned Fluoroalkylsilane Monolayer Surfaces

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: A. Takahara, Kyushu University, Japan
Authors: A. Takahara, Kyushu University, Japan
M. Morita, Kyushu University, Japan
J. Fukai, Kyushu University, Japan
H. Ishizuka, Kyushu University, Japan
Correspondent: Click to Email
Micropatterned fluoroalkylsilane monolayers were fabricated on a Si-wafer substrate by chemical vapor adsorption (CVA) of fluoroalkyltrialkoxysilane and vacuum ultraviolet (VUV)-ray photodecomposition under photomask with line-pattern. Field-emission scanning electron microscopic (FESEM) and atomic force microscopic(AFM) observations revealed that the micropatterned surface of fluoroalkylsilane and bare Si-wafer corresponding to the line-width of photomask was formed. Dynamic and static contact angle measurement revealed the anisotropy of water contact angles parallel and perpendicular to the line direction. Droplets of solution of polystyrene were deposited on the line-pattern by inkjet process from the orifice with a diameter of 50m It was revealed that the xylene solution was repelled from the oleophobic fluoroalkylsillane surface and the PS stripe corresponding to the line pattern shape was obtained.