AVS 51st International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS2-WeM

Paper PS2-WeM3
Control of Uniformity in Multifrequency Capacitively Coupled Plasmas Considering Edge Effects@footnote 1@

Wednesday, November 17, 2004, 9:00 am, Room 213B

Session: Plasma Sources
Presenter: J. Lu, University of Illinois at Urbana-Champaign
Authors: J. Lu, University of Illinois at Urbana-Champaign
M.J. Kushner, University of Illinois at Urbana-Champaign
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Multifrequency capacitively coupled plasmas are finding increasing use in etching and deposition applications. The optimization of ion flux uniformity is known to be a sensitive function of the edge electrical boundary condition embodied in the shape, permittivity and conductivity of the guard (or focus) ring. To investigate these geometrical and electrical effects, a 2-dimensional plasma hydrodynamics model has been developed which uses an unstructured numerical mesh. This meshing capability enables fine resolution of the substrate structures. The dependence of the ion flux uniformity on the electrical boundary condition using single and dual frequency operation (10s MHz and a few MHz with frequencies on one electrode or separate electrodes) will be discussed for process conditions of 10s mTorr in electropositive (Ar) and electronegative (Ar/fluorocarbon, Ar/O@sub 2@) mixtures. @FootnoteText@ @footnote 1@ Work supported by SRC and NSF.