AVS 51st International Symposium
    Plasma Science and Technology Monday Sessions
       Session PS2-MoA

Paper PS2-MoA3
Hot Hollow Cathode Diffuse Arc Deposition of Chromium Nitride Films

Monday, November 15, 2004, 2:40 pm, Room 213B

Session: Emerging Plasma Applications
Presenter: L. Bardos, Uppsala University, Sweden
Authors: H. Barankova, Uppsala University, Sweden
L. Bardos, Uppsala University, Sweden
L.-E. Gustavsson, Uppsala University, Sweden
Correspondent: Click to Email
The hollow cathode in the diffuse arc regime (arc with hot thermionic cathode) was used for deposition of chromium and chromium nitride films. The chromium hollow cathode serving as a gas inlet was connected to a radio frequency (rf) generator with the rf power up to 350 W. The process of generation and performance of the hollow cathode discharge and its transition to the arc regime was examined for different gases. The comparison is also given with other target metals. The reactive process of CrN deposition was investigated. Films were deposited on unheated silicon and steel substrates. Highly oriented crystalline CrN films were deposited at retes up to 4.5 @mu@m/min. The effect of process parameters and their correlation to properties (microcrystalline structure, hardness and deposition rate) of CrN is given.