AVS 51st International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS1-TuM

Paper PS1-TuM10
Impact of Vibrational States on Dissociation in Fluorocarbon and Hydrogenated Fluorocarbon Plasmas

Tuesday, November 16, 2004, 11:20 am, Room 213A

Session: Dielectric Etching
Presenter: P.L.G. Ventzek, Freescale Semiconductor
Authors: S. Adamson, Soft-Tec, Russia
K. Novoselov, Soft-Tec, Russia
A. Dement'ev, Soft-Tec, Russia
V. Kudrja, Soft-Tec, Russia
S. Rauf, Freescale Semiconductor
P.L.G. Ventzek, Freescale Semiconductor
Correspondent: Click to Email
Vibrational states of polyatomic molecules are known to have an important effect on the energy balance in plasmas and as such the plasma chemical kinetics. Less often considered is the impact of the population of vibrational states on individual processes associated with one species in which multiple vibrational states are often lumped. High density plasmas used for plasma processing may be characterized by relatively large gas temperatures (>700K) allowing for population of some low lying energy vibrational states. The presence of an ensemble of a few low lying energy states is significant as the cross-sections defining the transition to dissociation from states above ground may be quite different than those from ground. The dissociation processes associated with C4F6 and other CxHyFz plasmas are explored by treating the dissociation processes as bi-molecular using a diatomic model with the energies of the vibrational states being the states of the mode associated with the two pre-linked dissociating units. While not fundamental modes, they provide a means of exploring the scaling of electron impact reaction rates with temperature. Further they facilitate the exploration of assumptions built into simulations used to extract transport parameters for plasma process simulation (e.g., electron swarm simulations). In this presentation, the scaling of electron transport parameters and reaction rates for various electron impact processes with gas temperature and gas mixture are parameterized. These results are complemented with illustrative integrated equipment and feature scale simulations.