AVS 51st International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP19
Electrical Characteristics of Linear Internal-type Inductively Coupled Plasmas Source

Tuesday, November 16, 2004, 4:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: K.N. Kim, Sungkyunkwan University, South Korea
Authors: G.Y. Yeom, Sungkyunkwan University, South Korea
K.N. Kim, Sungkyunkwan University, South Korea
S.J. Jeong, Sungkyunkwan University, South Korea
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Inductively coupled plasma ICP sources have been studied extensively in the past ten years as candidates for advanced etch and deposition processing tools. Although ICP plasma sources have many advantages, the plasma generated is inherently non-uniform due to the antenna standing wave effect, when the plasma source is scaled to large size comparable to the driving rf wavelength. In this study, large-area plasmas with inductive coupling of extended internal linear- antennas have been proposed a promising candidate for an efficient high-density plasma source. The process chamber was designed as a rectangular mainly for 4th generation FPD application and was made of stainless steel. The inner size of the chamber was 1020mm*830mm. The characteristics of the plasmas were measured using a quadrupole mass spectrometer and a Langmuir probe located on the sidewall of the chamber. And the electrical characteristics of linear antennas were measured using an impedance probe. The results showed a strong relationship between the antenna design and plasma characteristics such as density and uniformity. Under an optimized antenna design, the uniformity of the Ar@super+@ ion density less than 4% could be obtained while maintaining high plasma densities on the order of 2.67*10@super11@cm@super-3@.