AVS 51st International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS-ThM

Paper PS-ThM11
Atmospheric Pressure Plasma Liquid Deposition - A New Route to High Performance Coatings

Thursday, November 18, 2004, 11:40 am, Room 213A

Session: Atmospheric and Microdischarges
Presenter: S.R. Leadley, Dow Corning Ltd., Ireland
Authors: S.R. Leadley, Dow Corning Ltd., Ireland
L. O'Neill, Dow Corning Ltd., Ireland
L.-A. O'Hare, Dow Corning Ltd., Ireland
A.J. Goodwin, Dow Corning Ltd., Ireland
Correspondent: Click to Email
Plasma enhanced coating processes are well known as a route to well adhered, conformal, high performance coatings. Dow Corning Plasma Solutions has developed a new coatings approach, which was invented in collaboration with the Department of Chemistry of the University of Durham, UK. Atmospheric Pressure Plasma Liquid Deposition combines atmospheric pressure glow discharge (APGD) technology with a unique precursor delivery system. This process operates at atmospheric pressure and ambient temperature allowing the use of a wide range of liquid precursors. The plasma causes polymerization of the precursor so that it is deposited as a conformal, well-adhered thin-film coating, which retains all the functionality and value of the original liquid monomer precursor. This technology retains flexibility with respect to process chemistry and the capability to deliver a vast range of surface functions through the mixing and matching of precursors. The aim of this presentation is to introduce the technology behind this new process and show examples of coatings that have been prepared using mixed monomers, so that the properties of the coating can be tailored.