AVS 51st International Symposium
    Plasma Science and Technology Monday Sessions
       Session PS-MoP

Paper PS-MoP16
Plasma Chemistry of a Nb/Ar/O@sub 2@ Magnetron Discharge

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: S. Mráz, RWTH Aachen, Germany
Authors: S. Mráz, RWTH Aachen, Germany
M. Wuttig, RWTH Aachen, Germany
J.M. Schneider, RWTH Aachen, Germany
Correspondent: Click to Email
We have investigated the plasma chemistry of a DC reactive magnetron discharge with a mass energy analyser. We have studied the effect of the oxygen partial pressure on the positive and negative ion populations of the discharge. The current supplied to the magnetron and the total pressure were kept constant throughout the experiments at 900 mA and 0.8 Pa, respectively. The plasma chemistry is strongly affected by the oxygen partial pressure. As the oxygen partial pressure is increased the formation of oxygen based positive and negative ions is observed. Furthermore, we present evidence for the oxygen partial pressure dependent presence of NbO based clusters, both positively and negatively charged. As the oxygen partial pressure is increased the NbO based clusters become the dominating Nb based ionic species in the plasma. These findings are of relevance for the chemical composition and structure evolution of thin NbO@sub x@ films.