| AVS 51st International Symposium | |
| Nanometer-scale Science and Technology | Wednesday Sessions |
| Session NS-WeM |
| Session: | Nanoscale Patterning and Lithography |
| Presenter: | W.K. Lee, Duke University |
| Authors: | W.K. Lee, Duke University M. Kaholek, Duke University S.J. Ahn, Duke University S. Zauscher, Duke University |
| Correspondent: | Click to Email |