AVS 51st International Symposium
    Nanometer-scale Science and Technology Wednesday Sessions
       Session NS-WeM

Paper NS-WeM6
Charge Interactions in Ferroelectric Substrates: the Basis of Ferroelectric Nanolithography

Wednesday, November 17, 2004, 10:00 am, Room 213D

Session: Nanoscale Patterning and Lithography
Presenter: D.B. Li, The University of Pennsylvania
Authors: D.B. Li, The University of Pennsylvania
R. Shao, The University of Pennsylvania
D.A. Bonnell, The University of Pennsylvania
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A new approach to directed assembly has recently been proposed that allows multiple nanostructures of diverse materials to be positioned in predefined locations. Ferroelectric Nanolithography has been demonstrated in the assembly of metal nanoparticle/functional organic molecule/oxide systems for a wide range of materials. The process is based on patterning ferroelectric domain orientation to control surface local electronic structure, which can be accomplished with exposure to electron beams and optical interference patterns. The underlying physics of these processes is not understood. This paper examines the effects of electron injection and electron-hole pair generation on surface ferroelectric polarization and charge compensation. The effects of dose, substrate thickness, and substrate morphology on pattern spatial resolution and stability are quantified for lead zirconate titanate and barium titanate films. For the case of electron-hole pair generation the mobile carriers compensate local atomic polarization at the surface. On high dose electron injection an electric field is established which reorients the polarization vectors. Both processes alter the local electronic structure by influencing surface band bending.