AVS 51st International Symposium
    Nanometer-scale Science and Technology Wednesday Sessions
       Session NS-WeM

Paper NS-WeM3
Surface-Programmed Assembly of Carbon Nanotubes on Silicon Oxide Surfaces for Integrated Circuit Applications

Wednesday, November 17, 2004, 9:00 am, Room 213D

Session: Nanoscale Patterning and Lithography
Presenter: M. Lee, Seoul National University, South Korea
Authors: M. Lee, Seoul National University, South Korea
J. Im, Seoul National University, South Korea
S. Hong, Seoul National University, South Korea
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As the microelectronics approaches its resolution limit, alternative electronic devices draw the attention of the scientific community. One strong candidate can be carbon nanotube (CNT)-based electronics. We developed a method to selectively assemble carbon nanotubes at a desired location with precise orientations on silicon oxide substrates. In this process, surface molecular patterns guide the assembly of CNTs onto desired locations. Importantly, we utilized only conventional microfabrication process such as photolithography for the entire process, which makes our method completely compatible with microfabrication techniques. This research can be utilized for fabrication of carbon nanotube-based electric circuits.