AVS 51st International Symposium
    Nanometer-scale Science and Technology Tuesday Sessions
       Session NS-TuP

Paper NS-TuP27
Mechanical Property and Nano Texture of Alumina-Silica Ultra Water Repellent Films

Tuesday, November 16, 2004, 4:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: M. Bekke, Nagoya University, Japan
Authors: M. Bekke, Nagoya University, Japan
Y. Wu, Nagoya University, Japan
N. Saito, Nagoya University, Japan
M. Koga, Nagoya University, Japan
Y. Inoue, Nagoya University, Japan
O. Takai, Nagoya University, Japan
Correspondent: Click to Email
Ultra water repellent (UWR) films have attracted significant attention due to both fundamental scientific interests and practical applications. It has been known that UWR film requires the surface with two factor, that is, adequate surface roughness and low surface energy. Wenzel and Cassie found a rule between surface roughness and water repellency. The surface roughness can be obtained using various fabrication methods such as sol-gel, plasma enhanced chemical vapor deposition (PECVD) and spray coating. Mechanical property of the film with large roughness is generally inferior to that of the smooth surface film. This is a crucial problem for an industrial application of UWR film. Therefore, it is necessary to improve the mechanical property of UWR film. In this research, we aim to prepare a UWR film with favorable mechanical properties using microwave plasma enhanced chemical vapor deposition (MPECVD). UWR film was fabricated on Si (100) substrate using the microwave plasma-enhanced chemical vapor deposition (MPECVD). Raw materials were trimethylmethoxysilane (TMMOS), CO@sub 2@ and Aluminum(III) diisoproxide ethylacetoacetate(ADE). The flux of the bubbling gas(CO@sub 2@) was changed and the quantity of the ADE was adjusted. The water-repellency of film was evaluated by water contact angle measurements. The surface morphology of UWR film was acquired by atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM). The chemical bonding states were characterized by Fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the film were evaluated by nanoindentation test.