AVS 51st International Symposium
    Exhibitor Workshop Wednesday Sessions
       Session EW-WeL

Paper EW-WeL2
Ultimate Nanoprobing in UHV: Four Independent Scanning Tunneling Microscopes Navigated by High Resolution UHV SEM

Wednesday, November 17, 2004, 12:20 pm, Room Exhibit Hall B

Session: Advances in SPM and Other Analytical Techniques
Presenter: M. Maier, OMICRON NanoTechnology GmbH, Germany
Authors: M. Maier, OMICRON NanoTechnology GmbH, Germany
J. Westermann, OMICRON NanoTechnology GmbH, Germany
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A main challenge in Nanotechnology is the integration of single nano-devices into large integrated circuits. Device technologies require high resolution topographical and chemical analysis with well established experimental techniques or electrical characterization using standard probing systems. Nevertheless, typical instrumentation lacks from one fundamental problem: Bridging dimensions of a fully integrated circuit down to the nanometer range (or even atomic scale) of single devices by using an adequate integrated navigation system. Moreover, sensitive nano-devices require ultra clean conditions, a goal which is best achieved under true UHV conditions. To meet these new requirements, we have established a new approach integrating state-of-the-art SPM technology with high resolution electron microscopy and spectroscopy: (1) Bridging dimensions and rapid navigation; (2) Combining different surface analysis methods at the very same sample area to gain complementary information; (3) Pushing each single technology to its inherent limits. The UHV NANOPROBE facilitates four independent Scanning Tunneling Microscopes, each one equipped with 3D coarse positioning and full STM capability. A UHV Gemini SEM column with ultimate resolution down to 3nm is used for probe navigation and rapid localization of sample features or devices. STM imaging is engaged to exactly position the local probe. Using STM probe approach technology, a controlled electrical contact is ensured to finally perform a four-point measurement on the nano-scale. Beyond that, the UHV Gemini SEM column itself has unsurpassed performance: Low beam energies down to 100eV avoid sample damage and makes imaging on insulators possible. Beam currents up to 10nA make this electron source an ideal base for high resolution chemical analysis with Scanning Auger Microscopy below the 10nm benchmark.