AVS 51st International Symposium
    Biomaterial Interfaces Monday Sessions
       Session BI-MoP

Paper BI-MoP12
Nanoscale Chemomechanical Patterning of Silicon and Germanium Surfaces Using an Atomic Force Microscope

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: R.C. Davis, Brigham Young University
Authors: R.C. Davis, Brigham Young University
M. Tonks, Brigham Young University
K. Barnett, Brigham Young University
M. Lee, Brigham Young University
M.R. Linford, Brigham Young University
Correspondent: Click to Email
In nanoscale chemomechanical patterning, an atomic force microscope (AFM) probe is used to scribe a flat silicon surface under a solution of reactive molecules, attaching a layer of the molecules to the scribed line. This technique was previously used to functionalize silicon surfaces using a moderate range of scribing forces (5 µN to 80 µN). Here we will present a study focusing on the smaller forces (1µN to 5 µN) on both silicon and germanium surfaces resulting in significantly reduced tip wear and yielding lines down to 20 nm wide. We will also present the extension of chemomechanical patterning to include the attachment of proteins to the functionalized lines.