AVS 51st International Symposium
    Applied Surface Science Monday Sessions
       Session AS-MoM

Paper AS-MoM5
TOF-SIMS Studies using a Newly Developed C@sub 60@@super +@ Primary Ion Gun: Fundamental Aspects and Applications

Monday, November 15, 2004, 9:40 am, Room 210A

Session: SIMS I - Cluster Probe Beams and General Topics
Presenter: R. Moellers, ION-TOF GmbH, Germany
Authors: R. Moellers, ION-TOF GmbH, Germany
F. Kollmer, ION-TOF GmbH, Germany
D. Rading, ION-TOF GmbH, Germany
T. Grehl, ION-TOF GmbH, Germany
E. Niehuis, ION-TOF GmbH, Germany
Correspondent: Click to Email
Recently it was shown that cluster primary ion bombardment leads to a considerable enhancement of the secondary ion emission efficiency for organic materials. This enhancement not only increases the sensitivity for molecular species up to several orders of magnitude, but also pushes the useful lateral resolution in organic imaging down to the sub-µm range. C@sub 60@ is currently discussed to be the most efficient projectile for organic surface analysis and first results have been published announcing depth profiling capabilities of C@sub 60@@super +@ primary ions on organic materials. We have integrated a newly developed C@sub 60@ ion gun into the TOF.SIMS 5. The gun can be operated both as sputter gun and as analysis gun with a primary ion energy of up to 20 keV using doubly charged C@sub 60@ particles. The new setup allows the direct comparison between different primary ions such as C@sub 60@@super +@, Au@sub 1@@super +@, Au@sub 3@@super +@ as well as the combination of metal cluster ions and C@sub 60@ in dual beam depth profiling. C@sub 60@@super +@ primary ions were used to extend our systematic investigation on the influence of different primary ion species, including metal cluster ions as well as monoatomic primary ions, on secondary ion parameters such as yield Y, damage cross section @sigma@ and efficiency E = Y/@sigma@. Those parameters have been evaluated for a variety of different sample materials and sample preparations allowing a classification of the merits of C@sub 60@ in different fields of application. Beside these fundamental aspects of cluster ion beam bombardment, the use of C@sub 60@@super +@ beyond the static limit on different samples will be highlighted.