AVS 51st International Symposium
    Applied Surface Science Friday Sessions
       Session AS-FrM

Paper AS-FrM7
Examining the Impacts of Ion Sputtering on Nanoparticles and Nanoporous Materials

Friday, November 19, 2004, 10:20 am, Room 210A

Session: FIB and Novel Ion Analysis Methods
Presenter: A.S. Lea, Pacific Northwest National Laboratory
Authors: A.S. Lea, Pacific Northwest National Laboratory
M.H. Engelhard, Pacific Northwest National Laboratory
D.J. Gaspar, Pacific Northwest National Laboratory
J.R. Williams, Pacific Northwest National Laboratory
D.R. Baer, Pacific Northwest National Laboratory
Correspondent: Click to Email
Nanostructured materials of various types and forms are increasingly subject to every type of chemical and physical analysis possible. During the course of studies on several different types of nanostructured materials, we have observed evidence that the extent of damage and material removal rates due to ion sputtering may be significantly different than for continuous films or bulk forms of similar materials. To confirm such effects, we need to know many details about size, size distribution, density, and shape that are not always readily obtained. This presentation will review our efforts to quantify the sputter and damage rates for some nanomaterial systems, including iron oxide nanoparticles and porous silica films. We are working to expand our range of information in more details for these materials and to different types of nano-sized objects. Material removal rates are monitored by XPS and AES and material structure information, including material amounts, is also measured by a variety of methods including TEM, XRD and Nuclear Reaction Analysis.