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Deadlines

Housing: September 18, 2007
Symposium: September 24, 2007

 


technical program

Greetings!


Welcome to the AVS 54th International Symposium & Exhibition!

As you peruse the program for the 54th AVS International Symposium and Exhibition you will note a couple of themes.

First, a central and defining theme of the AVS Program is surfaces/interfaces. Much of the technical program deals with the state-of-the-art science and technology of measurement, manipulation and processing/deposition of material interfaces and surfaces. The program covers the gamut of fundamental concepts and properties of surfaces/interfaces to methods and processes in manufacturing and devices. It covers biological materials to solid state electronics; it covers friction and wear in ambient conditions to thin film plasma deposition in a vacuum environment.

The second prevailing theme of the Symposium is Nano Science and Technology. As one moves to nanoscale materials and processes, surface and interface properties play a dominant role. Consequently, it is no surprise that much of the program encompasses various aspects of Nano Science and Technology. Nor is it a surprise that the AVS Program is (and has been for two decades) one of the premier venues for Nano programming. This year’s program continues the emphasis on Nano.

The third theme, which has evolved from the roots of the AVS in vacuum science and technology, is the use of controlled environments – from vacuum, to plasmas, to biological systems – for quantitative measurements and processing of materials interfaces. Today, one can find the use of controlled environments and measurements being applied to a spectrum of in vacuo, in situ, in operando, and in vivo systems in the AVS program.

In addition to the core AVS technical program, this year’s Symposium has some special programming. Five topical conferences (In situ Microscopy, Marine Biofouling, Nano-Manufacturing, Neutron Scattering, and Plasmonics) and two featured topics (Tribology and the BioInterfaces Plenary session on Global Health Technologies.) will run concurrent with the Symposium. Also, the American Institute of Physics’ Industrial Physics Forum (IPF) will be co-located with the AVS Symposium. The theme of this year’s IPF is “The Energy Challenge.” The program will augment sessions on energy in the core program. Given the importance of energy – its harvesting, storage and use – to our daily lives, this will be a must attend event.

We look forward to conferring with you in Seattle!

 

Thomas P. Beebe, Jr.
Vice-Program Chair
University of Delaware
John N. Russell, Jr.
Program Chair
Naval Research Laboratory
Bridget R. Rogers
Vice-Program Chair
Vanderbilt University

 

MAJOR Symposium Sponsors
Ambios manufactures high performance, state-of-the-art, surface metrology equipment for industrial and academic researchers.  Product line includes  stylus profilometers, non-contact optical profilers, and  AFM and SPM instruments. JEOL manufactures a full line of surface analysis instrumentation including ultra high resolution TEMs for elemental analysis in sub-micron areas; scanning Auger Microprobes; ultra high resolution, low voltage, field emission SEMs and UHV SEMs; and UHV-STM’s featuring a high temperature sample heating stage. Kratos Analytical will exhibit its line of high performance XPS multi-technique spectrometers designed for R&D applications. The AXIS Ultra provides the latest in spectroscopic and imaging capabilities with analytical flexibility. Also being exhibited is the AXIS Nova, an automated XPS instrument combining research level performance with automation and high throughput. NREL's mission and strategy are focused on advancing the U.S. Department of Energy's and our nation's energy goals. The laboratory's scientists and researchers support critical market objectives to accelerate research from scientific innovations to market-viable alternative energy solutions.
OMICRON NanoTechnology is the premier supplier of UHV instruments for nanoscience-related research. We invite you to visit our booth to see the latest results from the next generation Low Temperature (down to 4K) Atomic Force Microscope with enhanced LHe hold time. The Variable Temperature AFM/STM is now available with a non-optical force sensor. We will also be highlighting the ESCA+, NanoESCA and NanoSAM surface science systems. From thin film development to characterization, Omicron can help. Physical Electronics (PHI) is a subsidiary of ULVAC-PHI, the world's leading supplier of surface analysis instrumentation.  PHI’s innovative AES, XPS, and SIMS instruments are used to accelerate the development of advanced materials for a broad range of high technology applications. Thermo Electron Corporation will display the new K-Alpha Materials Characterization instrument. Using X-ray Photoelectron Spectroscopy (XPS), the K-Alpha enables rapid, accurate and cost-effective quantitative monitoring of the surface chemical composition of the top few nanometers of solid materials including insulators, semiconductors and metals for materials researchers as well as the emerging biotech, nanotech and pharmaceutical industries Vacuum Research Ltd: Manufacturer for 50 years of a broad line of high vacuum valves. Throttle valves, poppet style valves, rectangular port valves, and gate valves from ISO-63 to ISO-630.  Valves with ANSI and JIS flanges in similar sizes.