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Deadlines

Housing: September 18, 2007
Symposium: September 24, 2007

 


 

technical program

Major Award Recipients


The AVS Awards Assembly will be held on Wednesday, October 17, 2007 at 6:15 p.m. in Room 6C of the Washington State Convention Center to be followed immediately by an Awards Reception in Room 6E. This year, AVS honors the following awardees:

Major Awards & Recipients 


 

Medard W. Welch Award

 

The Medard W. Welch Award was established in 1969 to commemorate the pioneering efforts of M.W. Welch in founding and supporting AVS. It is presented to recognize and encourage outstanding research in the fields of interest to AVS. The award consists of a cash award, a struck gold medal, a certificate, and an honorary lectureship at a regular session of the International Symposium.
 

Dr. Jerry Tersoff, IBM T.J. Watson Research Center, “for seminal theoretical contributions to the understanding of surfaces, interfaces, thin films and nanostructures of electronic materials.”

Jerry Tersoff is a Research Staff Member at the IBM Thomas J. Watson Research Center. His work spans diverse topics in the theoretical understanding of surfaces, interfaces, electronic materials, epitaxial growth, and nanoscale devices. Throughout his career, his work has emphasized the use of simple models to understand complex behavior.

After studying physics at Swarthmore College (B.A. 1977) and University of California, Berkeley (Ph.D. 1982), he did postdoctoral work at Bell Laboratories before joining IBM in 1984. Through the mid-1980s he focused on two quite different problems. One was how to interpret images generated by the new experimental technique of scanning tunneling microscopy (STM). Together with Donald R. Hamann, he showed that the images could be interpreted in terms of surface electronic structure and topo-graphy, without reference to the complex tunneling problem. Despite (or because of) its simplicity, this model is still the practical basis for interpretation of STM images.

The other problem was the Schottky barrier at interfaces between metals and semiconductors, and closely related, the barrier to electron or hole transport at a semiconductor hetero- junction. At the time, these problems were widely believed to be unrelated, controlled by quite different mechanisms. But a single simple model proved sufficient to make quantitative estimates of barriers for both types of systems, in the process showing that the two phenomena were closely related to each other and to the intrinsic dielectric response.

He then turned to constructing simple classical models for the interactions of atoms in covalent materials such as Si, for use in large-scale simulations. A new approach enabled treatment of Si, Ge, C, and their compounds and alloys. These potentials are widely used.

In the early 1990s, the inspiring work of experimental colleagues at IBM and elsewhere drew him to study epitaxial crystal growth. In heteroepitaxy, misfit stress can drive rippling, step bunching, island formation, and self- organization of a variety of potentially useful nanostructures. Working with many experimental and theoretical collaborators, Tersoff has been deeply involved in the development of this field.

The development in 1998 of carbon nanotube transistors drew him back to electronic properties and Schottky barriers. With collaborators at IBM, he showed that these quasi-1D devices are quite different than conventional transistors, developing a comprehensive picture of their Schottky barrier switching mechanism, device characteristics, and scaling.

Tersoff’s work has been previously recognized by the AVS Peter Mark Memorial Award (1988), the MRS Medal of the Materials Research Society (1996), and the Davisson- Germer Prize of the American Physical Society (1997). He has served on the Executive Committee of the AVS Surface Science Division (1996-1998), the Editorial Board of Journal of Applied Physics and Applied Physics Letters (2001-2003), and the Board of Directors of the Materials Research Society (2003-2005). His published work has been cited over 17,000 times, including 14 papers that are cited over 400 times each (12 as first or sole author). He is a member of AVS and Materials Research Society, and a Fellow of the American Physical Society.

 


Albert Nerken Award

The Albert Nerken Award was established in 1984 by Veeco Instruments, Inc. in recognition of its founder, Albert Nerken, a founding member of AVS, and his early work in the field of high vacuum and leak detection, and contributions to the commercial development of that instrumentation. It is presented to recognize outstanding contributions to the solution of technological problems in areas of interest to AVS. The award consists of a cash award and a certificate.
 

Dr. Richard J. Colton, Naval Research Laboratory, “for seminal scientific insights that accelerated the development of vastly improved surface and nanoscale analytical techniques, and of innovative biomolecular sensors.”

Richard J. Colton holds two senior positions at the Naval Research Laboratory (NRL). As the Director of the Institute of Nanoscience, he coordinates and manages highly innovative, interdisciplinary research programs and facilities that operate at the intersections of the fields of materials, electronics and biology in the nanometer size domain. The facilities were designed to exploit and complement the broad multidisciplinary character of the NRL in order to bring together scientists with disparate training and backgrounds to attack common goals at the intersection of their respective fields at this length scale. He is also Acting Superintendent of the Chemistry Division which conducts basic and applied research in the following areas: chemical dynamics and diagnostics, materials chemistry, corrosion science and engineering, surface chemistry, and safety and survivability.

Dr. Colton earned B.S. and Ph.D. degrees from the University of Pittsburgh in 1972 and 1976, respectively, where he performed graduate work in the areas of ultraviolet and X-ray photoelectron spectroscopy. In 1976, he became a National Research Council Resident Research Associate at NRL working on secondary ion mass spectrometry. Dr. Colton joined the NRL Chemistry Division in 1977 as a research chemist working in surface chemistry. From 1982 to 1998 he was Head of the Advanced Surface Spectroscopy Section in the Surface Chemistry Branch, where he directed and obtained funding for R&D programs to characterize materials by electron and ion spectroscopies, determine the atomic and molecular structure of surfaces by scanning tunneling microscopy, develop new method to measure nanoscale adhesion, friction and mechanical properties of surfaces by atomic force microscopy, and develop novel physical, chemical and biological sensors using electron tunneling and molecular recognition. In 1986, while on sabbatical as a Visiting Associate at the California Institute of Technology, he built a scanning tunneling microscope and used it to understand the atomically–resolved imaging mechanism of graphite in air. In 1998, he became Head of the Surface Chemistry Branch, where he directed a highly interdisciplinary research program in surface chemistry and physics. The staff of ~70 people includes government employees, postdocs, contractors, visiting faculty, and students—the majority hold PhD degrees in chemistry, physics, materials science, or engineering. Major research topics include surface science, nanoscience and technology, nanostructured and electronic materials, chemical dynamics, tribology and coatings, and chemical/ biological sensors. In 2005, he became the Director of the Institute for Nanoscience. As Director, he manages laboratory R&D funds totaling $11M and nanofabrication facilities used for nanoscience research. In late 2006, he became the Acting Superintendent of the Chemistry Division.

Dr. Colton has published over 130 technical papers, including ten book chapters and five patents, which have been cited in the literature over 6000 times. He is a member of AVS, American Chemical Society, American Physical Society, Sigma Xi, and Materials Research Society. He was the first chairman of the AVS Division on Nanometer-scale Science and Technology in 1993, former chair of the AVS Applied Surface Science Division, and served on the AVS Board of Directors in 1992-93. He received the 1992 Hillebrand Prize awarded by the Chemical Society of Washington, was elected AVS Fellow in 1995, received the NRL-Edison Chapter of Sigma Xi Applied Research Award in 1999, and won numerous technical publication and technology transfer awards including the Federal Laboratory Consortium Award for Excellence in Technology Transfer in 2001. Dr. Colton also received the Navy Meritorious Civilian Service Award in 2003.

 


John A. Thornton Memorial Award and Lecture

The John A. Thornton Memorial Award and Lecture was established in 1989 as a memorial to Dr. John A. Thornton for his devotion to science, his singular contributions to the generation and study of thin films, his effectiveness as an educator, and his unfailing humility, which won him the uncommon esteem and affections of his colleagues. It is presented to recognize outstanding research or technological innovation in the areas of interest to AVS, with emphasis on the fields of thin films, plasma processing, and related topics. The award is conferred biennially. It consists of a cash award, a commemorative plaque stating the nature of the award, and an honorary lectureship at a regular session of the International Symposium.
 

Dr. Stephen J. Pearton, University of Florida, “for pioneering the science and application of advanced device fabrication techniques, including plasma etching, ion implantation for doping and electrical isolation, and formation of Ohmic and Schottky contacts for compound semiconductors.

Stephen J. Pearton is Distinguished Professor and Alumni Chair in the Department of Materials Science and Engineering at the University of Florida. Prior to joining UF in 1994 he was a Member of Technical Staff at AT&T Bell Lab-oratories in Murray Hill, NJ for 10 years where he was responsible for developing new process and fabrication methods for compound semiconductor devices used on data transmission systems.

He completed his B.S.in Physics at the University of Tasmania in Australia in 1978 and carried out his Ph.D research at the Australian Atomic Energy Commission under a scholarship from the Australian Institute of Nuclear Science and Engineering. He was a postdoctoral researcher at the University of California, Berkeley and Lawrence Berkeley Lab from 1982-1983. He is a Fellow of AVS, the American Physical Society(APS), The Electrochemical Society(ECS), the Institute of Electrical and Electronics Engineers (IEEE) and The Minerals, Metals and Materials Society(TMS). He is author of 1300 journal articles on electronic materials, physics of semiconductors, hydrogen in solids and device processing, 34 book chapters, 12 books,12 patents and has received over 23,000 citations in professional journals. He has served as editor of Solid State Electronics, associate editor of both JVST A and B and is on the editorial board of Applied Physics Letters, Journal of Applied Physics, Applied Physics Reviews, Materials Today, Materials Science and Engineering Reports.

His work encompasses a broad, multidisciplinary approach, borrowing from physics, chemistry, electrical, chemical and materials science and engineering to understand the effects of processing techniques on the performance of advanced compound semiconductor devices. These contributions have been critical to the commercialization of these devices in cell phones, wireless communication systems, collision-avoidance radar, high density DVDs and traffic lights and other displays. Many of the companies manufacturing these products use fabrication processes that are based on results initially developed by Pearton. His current work focuses on development of novel sensors, transparent thin film electronics and visible and UV laser and light-emitting diodes. He has presented more then 250 invited talks at national or international scientific conferences and won the ECS Electronics Division Award in 2005. He is married to Cammy Abernathy (also an AVS Fellow) and has an 8 year old son, Max, who is a great fan of the Florida Gators in all sports.

 


Peter Mark Memorial Award 

The Peter Mark Memorial Award was established in 1979 in memory of Dr. Peter Mark who served as Editor of the Journal of Vacuum Science and Technology from 1975 to 1979. The award is presented to a young scientist or engineer (35 years of age or under) for outstanding theoretical or experimental work, at least some of which must have been published in JVST. The award consists of a cash award, a certificate, and an honorary lectureship at a regular session of the International Symposium.
 

Dr. W.M.M. Kessels, Eindhoven University of Technology, “for pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth.”

W.M.M. Kessels (Erwin) currently holds a tenured Assistant Professorship in the Department of Applied Physics at Eindhoven University of Technology in the Netherlands. His work explores the synthesis of thin films, nanostructures, and devices using methods such as plasma-enhanced chemical vapor deposition, atomic layer deposition, and plasma etching. His research focuses particularly on the development of processes for thin-film manufacturing in collaboration with several industrial partners and it incorporates numerous applications such as microelectronics, photovoltaics, energy storage, photonics, and flexible electronics. In addition, a large part of the research is devoted to investigations of the plasma-surface interactions and thin film growth mechanisms. His research group develops and implements advanced surface- sensitive diagnostics - mostly based on linear and nonlinear optics - that can be applied in real time during film growth. The central theme within the work is to improve the understanding of the underlying reaction mechanisms in order to better control the chemical and physical processes such that the desired properties of thin films, processes, and devices can be designed to order.

In recent years, Erwin’s research interest in atomic layer deposition (ALD) has expanded. He focuses on plasma-assisted ALD processes to fully exploit the opportunities delivered by the process and to address its current challenges. He is active in both ALD tool and related hardware development and in the utilization of the technique in less traditional, non-semiconductor applications to establish the benefits of the plasma-based process for these types of applications.

Erwin received his M.S. and Ph.D. degrees (cum laude) in Applied Physics from the Eindhoven University of Technology in 1996 and 2000, respectively. His doctoral work, which was partly carried out at the University of California Santa Barbara, investigated the plasma deposition process of amorphous silicon. During his postdoctoral research Erwin investigated plasma-surface interactions at the Colorado State University and nonlinear surface spectroscopy at the Philipps University, Marburg (Germany). In 1999 he was the recipient of the Coburn and Winters Student Award of the AVS Plasma Science and Technology Division. In 2002, he was awarded a fellowship by the Royal Netherlands Academy of Arts and Sciences. In 2005, he spent a sabbatical leave at the University of California Berkeley.

Erwin has authored and co-authored over 80 papers in peer-reviewed journals and is co-inventor of several patents. He is an active member of the AVS, ECS, and MRS and serves on several international conference committees. Within AVS, he has served on the Executive Committee of the Plasma Science and Technology Division (2004-2007) and he will be chairing the 8th International Conference on Atomic Layer Deposition in 2008 as sponsored by the Thin Film Division.


MAJOR Symposium Sponsors
Ambios manufactures high performance, state-of-the-art, surface metrology equipment for industrial and academic researchers.  Product line includes  stylus profilometers, non-contact optical profilers, and  AFM and SPM instruments. JEOL manufactures a full line of surface analysis instrumentation including ultra high resolution TEMs for elemental analysis in sub-micron areas; scanning Auger Microprobes; ultra high resolution, low voltage, field emission SEMs and UHV SEMs; and UHV-STM’s featuring a high temperature sample heating stage. Kratos Analytical will exhibit its line of high performance XPS multi-technique spectrometers designed for R&D applications. The AXIS Ultra provides the latest in spectroscopic and imaging capabilities with analytical flexibility. Also being exhibited is the AXIS Nova, an automated XPS instrument combining research level performance with automation and high throughput. NREL's mission and strategy are focused on advancing the U.S. Department of Energy's and our nation's energy goals. The laboratory's scientists and researchers support critical market objectives to accelerate research from scientific innovations to market-viable alternative energy solutions.
OMICRON NanoTechnology is the premier supplier of UHV instruments for nanoscience-related research. We invite you to visit our booth to see the latest results from the next generation Low Temperature (down to 4K) Atomic Force Microscope with enhanced LHe hold time. The Variable Temperature AFM/STM is now available with a non-optical force sensor. We will also be highlighting the ESCA+, NanoESCA and NanoSAM surface science systems. From thin film development to characterization, Omicron can help. Physical Electronics (PHI) is a subsidiary of ULVAC-PHI, the world's leading supplier of surface analysis instrumentation.  PHI’s innovative AES, XPS, and SIMS instruments are used to accelerate the development of advanced materials for a broad range of high technology applications. Thermo Electron Corporation will display the new K-Alpha Materials Characterization instrument. Using X-ray Photoelectron Spectroscopy (XPS), the K-Alpha enables rapid, accurate and cost-effective quantitative monitoring of the surface chemical composition of the top few nanometers of solid materials including insulators, semiconductors and metals for materials researchers as well as the emerging biotech, nanotech and pharmaceutical industries Vacuum Research Ltd: Manufacturer for 50 years of a broad line of high vacuum valves. Throttle valves, poppet style valves, rectangular port valves, and gate valves from ISO-63 to ISO-630.  Valves with ANSI and JIS flanges in similar sizes.