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Deadlines

Housing: September 18, 2007
Symposium: September 24, 2007

 


 

technical program

Special Sessions/Workshops


 

ASTM-E-42 Workshop on Surface Analysis The Care and Feeding of Your XPS System: What Do You Need to Do to Know You Are Getting Appropriate Results?

William F. Stickle, HP Labs Corvallis

Sunday, October 14, 2007, 2:00 p.m., Willow Room, Sheraton Seattle Hotel

 

Abstract
Examination of the literature shows that the use of XPS is increasing around the world. Experienced XPS analysts can attest that the increased use is not always accompanied by a level of knowledge that enables the most useful or most reliable information to be extracted from the data collected. The purpose of this workshop is to provide an overview of the types of issues and concerns that should be addressed to assure those that operate XPS instruments or rely on their data of the quality of information they are getting.

At first glance acquiring data from a sample using XPS is fairly straightforward: Mount the sample and introduce it into the spectrometer, acquire data, identify the peaks, determine the chemistry, provide results. But each of these steps actually has a number of background details that are often not obvious to the sample submitter and sometimes to the analyst. For example, consider the sample: how has the sample been handled, is the sample vacuum compatible, are there likely to be volatile components present that might not be detected, if so how would one determine this and what alternatives exist for a thorough analysis? Are there other sample preparation details to consider?

Once the sample is in the spectrometer there are the data collection and spectrometer details: Is the energy scale in calibration, what about spectral resolution vs. intensity, how long should the acquisition take, is the sample x-ray sensitive, is the ion gun sputter rate known, what about preferential sputtering, what about ion beam damage and so on? Then after the data are acquired, can one rely on the relative sensitivity factors to provide reasonable quantification, how accurately can binding energies be reported, can the handbook or literature values be believed, which peaks are most useful for analysis?

This workshop will examine some to these aspects of analysis; which need to be considered on a daily basis versus what should an analyst worry about over a longer time frame. The presentation and input from different expert users will also take into consideration various viewpoints from academia to industry.


MAJOR Symposium Sponsors
Ambios manufactures high performance, state-of-the-art, surface metrology equipment for industrial and academic researchers.  Product line includes  stylus profilometers, non-contact optical profilers, and  AFM and SPM instruments. JEOL manufactures a full line of surface analysis instrumentation including ultra high resolution TEMs for elemental analysis in sub-micron areas; scanning Auger Microprobes; ultra high resolution, low voltage, field emission SEMs and UHV SEMs; and UHV-STM’s featuring a high temperature sample heating stage. Kratos Analytical will exhibit its line of high performance XPS multi-technique spectrometers designed for R&D applications. The AXIS Ultra provides the latest in spectroscopic and imaging capabilities with analytical flexibility. Also being exhibited is the AXIS Nova, an automated XPS instrument combining research level performance with automation and high throughput. NREL's mission and strategy are focused on advancing the U.S. Department of Energy's and our nation's energy goals. The laboratory's scientists and researchers support critical market objectives to accelerate research from scientific innovations to market-viable alternative energy solutions.
OMICRON NanoTechnology is the premier supplier of UHV instruments for nanoscience-related research. We invite you to visit our booth to see the latest results from the next generation Low Temperature (down to 4K) Atomic Force Microscope with enhanced LHe hold time. The Variable Temperature AFM/STM is now available with a non-optical force sensor. We will also be highlighting the ESCA+, NanoESCA and NanoSAM surface science systems. From thin film development to characterization, Omicron can help. Physical Electronics (PHI) is a subsidiary of ULVAC-PHI, the world's leading supplier of surface analysis instrumentation.  PHI’s innovative AES, XPS, and SIMS instruments are used to accelerate the development of advanced materials for a broad range of high technology applications. Thermo Electron Corporation will display the new K-Alpha Materials Characterization instrument. Using X-ray Photoelectron Spectroscopy (XPS), the K-Alpha enables rapid, accurate and cost-effective quantitative monitoring of the surface chemical composition of the top few nanometers of solid materials including insulators, semiconductors and metals for materials researchers as well as the emerging biotech, nanotech and pharmaceutical industries Vacuum Research Ltd: Manufacturer for 50 years of a broad line of high vacuum valves. Throttle valves, poppet style valves, rectangular port valves, and gate valves from ISO-63 to ISO-630.  Valves with ANSI and JIS flanges in similar sizes.