AVS 53rd International Symposium & Exhibition November 12 -17, 2006 Moscone West Convention Center  San Francisco, CA

This year for the first time the American Institute of Chemical Engineers (AIChE) and AVS PSTD are co-sponsoring a session devoted to plasma-surface interactions. The session will occur on Tuesday morning highlighted by a talk by Vincent Donnelly of the University of Houston on new methods for probing phenomena at surfaces being modified by plasmas. Chemical engineering has played a strong role in the evolution of plasma science and today many noted plasma science groups reside in chemical engineering departments. The papers in the plasma surface interactions session (the first of three at the meeting) underscore the importance of clarifying the complex phenomena occurring at the plasma wall interface for the benefit technology and the richness of the fundamental science residing at the plasma-surface interface.

AIChE attendees will be able to attend the joint AIChE-AVS session and the AVS Exhibition free-of-charge. In addition, any AIChE attendees wishing to attend more of the AVS Technical Program may present their AIChE badge at registration and receive a special discount rate of $100 for a One Day registration.

MAJOR Symposium Sponsors

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