Technical Symposia

• Advanced Surface Engineering
• Applied Surface Science
• Biomaterial Interfaces
• Electronic Materials & Processing
• Magnetic Interfaces & Nanostructures
• MEMS & NEMS
• Manufacturing Science & Technology
• Nanometer-scale Science & Technology
• Plasma Science & Technology
• Surface Science
• Thin Film
• Vacuum Technology
• Nano -Content Sessions

Advanced Surface Engineering Division (SE)

Program focuses on new materials, coatings, technologies, characterization, manufacturing, applications, and fundamentals of surface engineering. Dedicated sessions are planned for hard and nanocomposite coatings, pulsed plasmas, glancing angle deposition, photocatalytic coatings, and deposition and surface treatments at atmospheric pressure. These sessions will particularly emphasize fundamental understanding of the synthesis, structure, and property correlations in multilayered and functionally gradient, hard and nano-composite coatings; advances in glancing and oblique angle deposition; pulsed plasma technologies and HIPIMS, deposition of novel coatings and treatment of engineering surfaces by atmospheric pressure plasmas, understanding of friction and wear mechanisms and tribochemistry of protective coatings and surface treatments; conventional (TiO2 and doped TiO2) and alternative photocatalytic coatings. Under these topics, presentations on novel coating materials, processes, design and modeling, diagnostic and growth control, structural, chemical, and mechanical characterizations, wear and corrosion protection, oxidation resistance and thermal stability, self-cleaning processes and air/water purification, and other aspects related to surface engineering and coatings are solicited.

SE1+NC Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties
- G.C.A.M. Janssen, Delft University, The Netherlands,
"Stresses in Hard Coatings"
- J.-P. Riviera, Universite de Poitiers - UFR Sciences - SP2MI, France,
Structural Development and Mechanical Properties of TiN-Ni Nanocomposite Coatings"

SE2+PS Pulsed Plasmas in Surface Engineering
- J. Emmerlich, RWTH Aachen, Germany,
"Deposition Rate of High-Power-Pulse Magnetron Sputtering Processes"
- J.T. Gudmundsson, University of Iceland,
"On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)"

SE3+TF+NC Glancing Angle Deposition
- A. Lakhtakia, Pennsylvania State University,
"Sculptured Thin Films: Something Old, Something New, Something Borrowed, Something Blue"
- Y. Zhao, University of Georgia,
"Glancing Angle Deposition at the Nano-Bio Interface"

SE4 Deposition and Plasma Surface Treatments at Atmospheric Pressure
- L. O'Neill, Dow Corning Plasma Solution, Ireland,
"Controlling Plasma Deposition with Liquid Aerosol Precursors"
- K.-D. Weltmann, INP Greifswald, Germany

SE5 Photocatalytic Coatings
- J.-M. Herrmann, Institut de Recherches sur la Catalyse et l'Environnement de Lyon, France,
"Rules for Efficient Titania Coatings: Applications to Water, Air and Material Cleaning"
- T. Watanabe, The University of Tokyo, Japan,
"Wettability Controlled Surface of Photocatalytic Coatings"

SE6 Advanced Surface Engineering Poster Session

EN1+SE+NS+SS+NC Hydrogen Storage
- D. Mitlin, University of Alberta, Canada,
"Light-Element Destabilized Mg-based Thin-Film Alloys for Hydrogen Storage"
- P. Sutter, Brookhaven National Laboratory,
"Atomistic Mechanisms of Reversible Hydrogen Storage in Complex Metal Hydrides"

EN6+BI+SS+SE Catalysis for Energy Sustainability
- C.L. Marshall, Argonne National Laboratory,
"Size, Shape, and Support Effects in Oxidative Coupling Reactions"
- J.K. Norskov, Technical University of Denmark,
"Understanding Trends in the Catalytic Activity of Transition Metals"

TR2+SE+TF Advances in Surface Engineering for Friction and Wear Control
- A. Cavaliero, University of Coimbra, Portugal,
"Latest Developments on the Family of C-alloyed TMD Self-lubricating Coatings"

Applied Surface Science Division (AS)

The understanding of materials properties at surfaces and interfaces is critical to advances in areas encompassing energy technologies, biosensors, nanomaterials, and microelectronics. The Applied Surface Science Division (AS) welcomes original work in applied and basic research of surfaces and interfaces. The program will include core areas devoted to electron spectroscopies, cluster ion beams, advanced methods for data analysis, and practical surface analysis. Sessions are also included under the special topical focus areas of energy science, nanomanufacturing, and biological and soft materials that will cover applied characterization aspects of these timely and important areas. In addition, there will be a poster session covering aspects of applied surface science. Students are encouraged to participate in the Student Presentation Competition, where both posters and oral presentations will be allowed. We look forward to your submission to this exciting program in Boston.

AS1+NC Electron Spectroscopies
- J. Watts, University of Surrey, UK, "Probing the Interfacial Chemistry of Polymer-Metal Systems with Electron Spectroscopy"

AS2 Use of Cluster Ion Beams for Surface Analysis
- A. Wücher, University of Duisburg-Essen, Germany, "Three-dimensional Sputter Depth Profiling of Molecular Structures: Prospects and Limitations"

AS3 Advanced Data Analysis for Surface Characterization
- K. Artyushkova, University of New Mexico, "Using Multivariate Analysis and Modeling for Structure-to-Property Relationships Built from XPS Spectroscopic and Imaging Data"

AS4 Practical Surface Analysis
- I.W. Fletcher, Intertek MSG, UK, "Practical Surface Analysis: Beyond Acquisition - The Human Factors"

AS5 Aspects of Surface Analysis Poster Session

BO1+PS+AS+BI+SS Plasma-deposited, Polymer and Organic Surfaces in Biological Applications
- M. Alexander, The University of Nottingham, UK, "High Throughput Surface Chemical Analysis on Polymer Microarrays: Wettability, Protein Adsorption and Cell Response Correlations"
- G. Bussetti, Johannes Kepler University, Austria
- A. Fridman, Drexel University, "Plasma Medicine"

BO2+SS+AS+PS+NC Organized, Assembled and Structured Organic Interfaces
- J. Laskin, Pacific Northwest National Laboratory, "Modification of Self-Assembled Monolayer Surfaces Using Hyperthemal Ion Beams"
- A. Wendt, University of Wisconsin, "Plasma Etching for Selective Removal of PMMA from nm-scale PS/PMMA Block Copolymers for Lithographic Applications"
- X. Zhang, Tsinghua University, China, "Inorganic Colloid-Polymer Organized Films with New Functions"

BO3+AS+BI+NC Advances in Surface Analysis of Organic and Biological Interfaces
- H. Nygren, Göteborg University, Sweden, "Analysis of Biological Samples by TOF-SIMS"

EN3+AS+EM+TF+VT+NC Electrochemical Storage
- A.C. Dillon, National Renewable Energy Laboratory, "Metal Oxide Nanoparticles for Next-generation Li-ion Battery Electrodes"
- L.F. Nazar, University of Waterloo, Canada, "Material Solutions for Solid State Energy Storage"
EN5+AS+TF+VT+NC Energy: Tools and Approaches
- W.S. Sampath, Colorado State University, "Large Area Continuous In-Line Processing of CdTe Photovoltaics"
- M. Yudaskaka, NEC, Japan, "Production and Application of Carbon Nanohorns"

NM4+AS+NC Nanomaterial Metrology
- G. Gross, Boeing, "Practical Considerations for Implementation of Nanomaterials in Aerospace"

Biomaterial Interfaces Division (BI)

In the tradition of the Biomaterial Interfaces Division (BI), a broad technical program has been established, incorporating classical topics such as Proteins and Cells at Interfaces, Engineering Biointerfaces and Quantitative Analysis of Biointerfaces. Additionally, new innovations and recent trends are covered in the sessions Quantitative Nanoscale Sensing, Single Molecule Techniques and Plasmonics in Surfaces and Nanomaterials. BID also participates in a cross-cutting Featured Topics on Biological, Organic and Soft Materials. In addition, a special session honoring Prof. Bengt Kasemo, Chalmers, Sweden, who in past years has contributed significantly to establishing the BID effort at AVS is scheduled. Hence, this year's program spans essentially all aspects of traditional and innovative aspects of biointerface and biomaterial science. Consistent with the vision of the BID, its technical program provides a forum that explores the current challenges at the interface of materials, biological systems, technique development and surface science. Progress in biotechnologies, biomedical devices, prominent industrial problems in the environment and medicine, and methods to evaluate and interrogate complex biological system-interfaces are the primary objectives.

BI1+SS+NC Honorary Session for Bengt Kasemo
- F. Besenbacher, University of Aarhus, Denmark, "SPM Studies of DNA Building Blocks on Surfaces"
- A. Brisson, University of Bordeaux, France, "2D Self-assembly of Proteins on Lipid Surfaces: From Biological Function to Biotechnological Applications"
- C. Frank, Stanford University, "Interaction of AH Amphipathic Peptide with Lipid Bilayers and Application to the Understanding of Hepatitis C Viral Infection via QCM-D Measurements"
- B. Kasemo, Chalmers University of Technology, Sweden, "From surface science to biointerface science and back again"
- W. Knoll, MPIP, Mainz, Germany, "The Tethered Bimolecular Lipid Membrane as a Novel Model Membrane Platform"

BI2+NC Quantitative Nanoscale Sensing and Single Molecule Techniques
- A. Armani, California Institute of Technology, "Biophotonics: Resonant Detection of Single Molecules"
- D. Klenerman, Cambridge University, UK, "Single Molecules on Living Cells"

BI3 Proteins and Cells at Interfaces
- D. Leckband, University of Illinois, "Multiscale Investigations of Cell Adhesion"
- M. Lutolf, EPFL, Switzerland, "Exploring Single Stem Cell Biology via Microarrayed Artificial Niches"

BI4 Quantitative Analysis of Biointerfaces
- M. Grunze, University of Heidelberg, Germany, "Structure of Water: Myth or Reality?"
- S. Roke, MPI-MF, Stuttgart, Germany, "Nonlinear Optical Scattering: Bridging the Gap between Soft Matter and Surface Science"

BI5 Engineering Biointerfaces
- D. Walt, Tufts University, "Optical Fiber Microarrays for Single Molecule Detection"
- C. Steinem, University of Göttingen, Germany, "Electrically Insulating Pore-Suspending Membranes on Highly Ordered Porous Alumina"
- A. Perikh, University of California, "Engineering Membrane Physical Properties and Dynamics using Structured Interfaces"

BI6+TF+MI+NS+NC Plasmonics and Magneto/Plasmonics Aimed at Bio-Sensing
- C. Clavero, College of William and Mary, "Developments in Magneto/Plasmonic Devices"
- A. Lazarides, Duke University, "Energy Transport in Nanoparticle Systems/Theory"
- X. Zhang, University of California, Berkeley, "Plasmonic Fabrication"
-S. Zauscher, Duke University

BI7+PS Biomaterials Interfaces Poster Session

BO1+PS+AS+BI+SS Plasma-deposited, Polymer and Organic Surfaces in Biological Applications
- M. Alexander, The University of Nottingham, UK, "High Throughput Surface Chemical Analysis on Polymer Microarrays: Wettability, Protein Adsorption and Cell Response Correlations"
- G. Bussetti, Johannes Kepler University, Austria
- A. Fridman, Drexel University, "Plasma Medicine"

BO3+AS+BI+NC Advances in Surface Analysis of Organic and Biological Interfaces
- H. Nygren, Göteborg University, Sweden, "Analysis of Biological Samples by TOF-SIMS"

BO4+EM+BI+NC Semiconducting Biointerfaces and Sensors
- W. Lu, The Ohio State University, "Biosensors from GaN Nanowires and Transistors"

BO5+NS+BI+NC Biological and Molecular Applications of Nanostructures
- J. Spatz, Max Planck Institute for Metals Research, Germany, "Nanoscopic Presentation of Peptides at Cell Interfaces"

EN6+BI+SS+SE Catalysis for Energy Sustainability
- C.L. Marshall, Argonne National Laboratory, "Size, Shape, and Support Effects in Oxidative Coupling Reactions"
- J.K. Norskov, Technical University of Denmark, "Understanding Trends in the Catalytic Activity of Transition Metals"

Electronic Materials and Processing Division (EM)

Sponsors sessions on electronic materials growth, processing, characterization, and structure-property relationships. Papers are solicited in the fields of complex and multifunctional oxides, ZnO materials and devices, and high-k oxides and high mobility substrates. Papers focusing on flexible or transparent electronics as well as molecular and organic electronics are also encouraged. The reliability of wide band gap semiconductors for electronic and optical devices, as well as the role of contacts, interfaces, and defects in semiconductors are also of interest. In addition, Electronic Materials and Processing solicits papers in four AVS-wide focused topics: graphene and carbon electronics, manufacturing of nanostructures, semiconducting biointerfaces and sensors, and photovoltaics.

EM1 Reliability of Wide Band Gap Electronic and Optical Devices
- M. Shur, Rensselaer Polytechnic Institute

EM2 Complex and Multifunctional Oxides
C.H. Ahn, Yale University

EM3 Electrical and Physical Properties of High-k Gate Dielectrics on III-V Semiconductors
- E.M. Vogel, University of Texas at Dallas

EM4 Contacts, Interfaces, and Defects in Semiconductors
- A.A. Talin, Sandia National Laboratories, "Barrier Formation and Transport in Metal Contacts to Nanotubes and Nanowires"

EM5 Flexible Transparent Electronics
-T.N. Jackson, Penn State University

EM6 Molecular and Organic Electronics
- N.C. Tao, Arizona State University

EM7 ZnO Materials and Devices
C.F. McConville, University of Warwick, UK

EM8 Electronic Materials and Processing Poster Session

BO4+EM+BI+NC Semiconducting Biointerfaces and Sensors
W. Lu, The Ohio State University, "Biosensors from GaN Nanowires and Transistors"

EN3+AS+EM+TF+VT+NC Electrochemical Storage
A.C. Dillon, National Renewable Energy Laboratory, "Metal Oxide Nanoparticles for Next-generation Li-ion Battery Electrodes"
L.F. Nazar, University of Waterloo, Canada, "Material Solutions for Solid State Energy Storage"

EN4+EM+NS+PS+TF+NC Photovoltaics
S. Siebentritt, University of Luxembourg, "Thin Film Preparation of Chalcopyrites for Solar Cells and Fundamental Material Physics"
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, "Thin Film Technologies for 1st, 2nd and 3rd Generation Solar Cells"

NM3+TF+EM+NC Printable Lithography / Nanoimprint
J. Rogers, University of Illinois, Urbana-Champaign, "Printing Techniques for Electronics"

TR1+EM+NS+NC Nanotribology and Nanomechanics
G. Haugstad, University of Minnesota, "Frictional and Transverse Shear Forces as Probes of Disorder and Anisotropy in Organic Semiconductors"

 Magnetic Interfaces and Nanostructures Division (MI)

Program features recent results and technological challenges regarding magnetic and spintronic materials and devices. Presentations will include basic and applied experimental and theoretical studies of magnetism, synthesis and processing of new magnetic materials, and advances in magnetic technologies. The program highlights new directions in spintronics, a topic that was spawned by the discovery of the giant magnetoresistive effect. This breakthrough garnered the Nobel Prize in Physics in 2007 for Albert Fert and Peter Grunberg. Additional topics include magnetization and domain wall dynamics, magnetic spectroscopy and imaging, manipulation of magnetic atoms and molecules, organic spintronics, spin injection and manipulation, magnetic semiconductors, magnetism at surfaces and interfaces and magnetic nanoparticles. The Magnetic Interfaces and Nanostructures Division sponsors the Leo Falicov Award for the best graduate student oral presentation in MI sessions. The winner of this award will be selected from six semifinalists and will receive a cash prize of $1,000.

MI1+NC New Directions in Spintronics
-A. Fert, Unité Mixte de Physique CNRS/Thales, France, "Spin Transport between Spin-Polarized Sources and Drains: Advantage of Carbon Nanotubes on Semiconductors"
-J. Moodera, Massachusetts Institute of Technology, "Spin Tunneling and Transport through Organic Semiconductors - Towards Large Spin Relaxation Length"
-B. Pratt, Michigan State University, "Current Perpendicular to Plane Giant Magnetoresistance in Magnetic Multilayers"
-C. Ross, Massachusetts Institute of Technology, "Magnetism and Magnetoresistance in Multilayer Thin Film Rings"

MI2+NC Magnetic Spectroscopy and Imaging, Spin Polarized Scanning Tunneling Microscopy, Manipulation of Magnetic Atoms and Molecules
-A. Heinrich, IBM Research Division, "Probing Individual Magnetic Nanostructures with Spin Excitation Spectroscopy"
-K. von Bergmann, University of Hamburg, Germany, "Complex Magnetic Order on the Atomic Scale Revealed by SP-STM"

MI3+NC Organic Spintronics and Magnetic Sensors
-A. Caruso, North Dakota State University, "Organic-based Magnetoelectronics from an Electronic Structure View"

MI4+NC Magnetic Surfaces, Interfaces, Thin Films, Heterostructures and Nanoparticles
-S. Majitec, Carnegie Mellon University, "Nanomasking of Magnetic Thin Films with Nanoparticles"

MI5+NC Magnetization and Domain Wall Dynamics, Spin Injection, Magnons and Magneto Optics
-T. Mewes, University of Alabama, "Magnetization Damping in Magnetic Multilayers"

MI6 Magnetic Interfaces and Nanostructures Poster Session

MEMS and NEMS Technical Group (MN)

Program will highlight recent advances in the development of functional, integrated micro and nanoelectromechanical devices. This year's session will cover areas that are thematically related to the materials processing and characterization, fabrication approaches, surface and interface sciences of MEMS and NEMS, and integration and packaging strategies of MEMS and NEMS. Applications of MEMS and NEMS devices in resonant sensing of chemical and biological immunospecific binding events, study of parametric dynamical phenomenon of coupled oscillator systems, electronics integration, fluidic channel encapsulation of nanostructures and dissipation mechanisms are also addressed. MEMS and NEMS will host three oral sessions including a joint session with the Tribology Program (TR). The program opens with a session focused on the integrative materials and processes for MEMS and NEMS devices. The second session will cover fabrication at the micro- and nano-scales for MEMS and NEMS devices. The final session covers materials processing, characterization and novel approaches to the fabrication of MEMS and NEMS.

MN1 Integrative Materials and Processes for MEMS/NEMS
- G. Piazza, University of Pennsylvania

MN2+NC Fabrication at the Micro- and Nano- Scales for MEMS/NEMS
- L. Ocola, Argonne National Laboratory

MN3 Materials Processing and Characterization for MEMS/NEMS
S. Manalis, Massachusetts Institute of Technology

MN4 MEMS and NEMS Poster Session

TR3+MN+NC Surfaces and Interfaces in MEMS/NEMS
- D.W. Brenner, North Carolina State University

Manufacturing Science and Technology Group (MS)

In the 21st century, manufacturing will continue to drive a sizeable percentage of the world's gross national product and will provide the bridge for spanning fundamental sciences and commercial production of the high technology products. The MSTG is continuing to expand its efforts to include all areas of nano-manufacturing while maintaining its core competence in semiconductor manufacturing. As part of the 55th International Symposium of AVS, the focus for the Manufacturing Science and Technology Group will be to explore nano-manufacturing research areas across a broad spectrum of the high technology industries. The MSTG will co-sponsor a Topical Conference on Nano-manufacturing which will hold an all invited session covering the critical topic of “Beyond CMOS nano-electronics" for “nano” technology. We will hold two sessions. The first session, CMOS Manufacturing: Present and Future, will have one invited presentation. It will cover processes, integrations, and devices for CMOS 32nm technology and beyond. The second session, Metrology in Nano-manufacturing, will feature one invited presentation covering new materials and sub-45nm process characterization which are moving toward routine applicability for semiconductor manufacturing.

MS1+NC CMOS Manufacturing: Present and Future
- B. Doris, IBM Research, "32 nm CMOS and Beyond"

MS2+NC Metrology in Nano-manufacturing
- E. Zschech, AMD, Germany, "From Lab to Fab - Integration of Analysis and Metrology for Future Technology Nodes"

NM1+NS+MS+NC Manufacturing of Nanostructures
- M. Bawendi, Massachusetts Institute of Technology, "Semiconductor Nanocrystals (aka Q Dots)"
- P. Ferreira, University of Illinois, Urbana-Champaign, "Patterned Electrochemical Ion-Etching"
- L. Samuelson, Lund University, Sweden, "Nanowires"

NM5+MS+NC Beyond CMOS Nanoelectronics
- M. Fuhrer, University of Maryland, "Intrinsic and Extrinsic Limits of Charge Carrier Mobility in Graphene"
- V. LaBella, University of Albany, "Semiconductor Based Spintronic Structures: Challenges and Opportunities (at INDEX)"
- J. Lee, University of Albany, "Excitonic Circuits for Post-CMOS Applications (at INDEX)"
- A. MacDonald, University of Texas, Austin, "Graphene Electronic Devices"

Nanometer-scale Science and Technology Division (NS)

The scientific and technological drive to smaller and smaller structures has been responsible for much of the scientific, technological, and economic progress in the last 50 years and the recent explosion of nanoscience and technology. The challenges and opportunities in nanoscience are huge and roughly scale inversely proportional to the size scale of the features that we wish to fabricate, control and manipulate. New principles for characterization, fabrication, and the convergence of top-down and bottom-up manufacturing techniques at the nanoscale are driven by interdisciplinary scientific areas covering chemistry, biology and physics. The Nanoscale Science and Technology Division seeks papers on characterization, imaging, patterning, assembly, manipulation, nanotribology, and other processes that operate in the nanoscale regime and/or produce nanoscale structures. We are also accepting papers for nanoscale devices and sensors. We will host a Special Session on "The Frontiers of Nanoscience" featuring some of the world's leading researchers in this exciting field.

NS1+NC Characterization and Imaging of Nanostructures
- M. Bode, Argonne National Laboratory, "Spin Polarized STM"

NS2+NC Nanolithography
- R. Ruiz, Hitachi Global Storage Technologies, "Pattern Error Correction by Lithographically Guided Self Assembly"

NS3+NC Nanoscale Assembly
- P.F. Nealey, University of Wisconsin, Madison

NS4+NC Nanoscale Manipulation
- L. Wan, The Chinese Academy of Sciences, "Characterization, Manipulation, and Fabrication with an STM"

NS5+NC Nanoscale Devices and Sensors
- B. Lim, Atomate, "CNTFET: Carbon Nanotube Power Transistors"

NS6+NC Nanoscale Processes
- L. Pfefferle, Yale University, "Ultra High Quality CNT Processing"

NS7+NC The Frontiers of Nanoscience (Invited Papers Only)
- D. Allara, Penn State University
- S. Morita, Osaka University, Japan, "Atomic Resolution AFM"
- G.M. Whitesides, Harvard University
- S. Williams, Hewlett-Packard Laboratories, "Memristive Switching, Memory and Logic at the Nanoscale"

NS8 Nanometer-scale Science and Technology Poster Session

BO5+NS+BI+NC Biological and Molecular Applications of Nanostructures
J. Spatz, Max Planck Institute for Metals Research, Germany, "Nanoscopic Presentation of Peptides at Cell Interfaces"

EN1+SE+NS+SS+NC Hydrogen Storage
- D. Mitlin, University of Alberta, Canada, "Light-Element Destabilized Mg-based Thin-Film Alloys for Hydrogen Storage"
- P. Sutter, Brookhaven National Laboratory, "Atomistic Mechanisms of Reversible Hydrogen Storage in Complex Metal Hydrides"

EN2+NS+NC Efficient Energy Utilization
- P. Hammond, Massachusetts Institute of Technology, "Layer-By-Layer Approaches to Electrochemical Energy and Storage"
- C.-F. Lin, National Taiwan University, "Nano-Structured Semiconductors for Better Efficiency of Solar Cells"

EN4+EM+NS+PS+TF+NC Photovoltaics
- S. Siebentritt, University of Luxembourg, "Thin Film Preparation of Chalcopyrites for Solar Cells and Fundamental Material Physics"
- M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, "Thin Film Technologies for 1st, 2nd and 3rd Generation Solar Cells"

NM1+NS+MS+NC Manufacturing of Nanostructures
- M. Bawendi, Massachusetts Institute of Technology, "Semiconductor Nanocrystals (aka Q Dots)"
- P. Ferreira, University of Illinois, Urbana-Champaign, "Patterned Electrochemical Ion-Etching"
- L. Samuelson, Lund University, Sweden, "Nanowires"

TR1+EM+NS+NC Nanotribology and Nanomechanics
- G. Haugstad, University of Minnesota, "Frictional and Transverse Shear Forces as Probes of Disorder and Anisotropy in Organic Semiconductors"

Plasma Science and Technology Division (PS)

The Plasma Science and Technology Division (PS) will feature state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to applications of plasma processing in the fabrication of electronic, optoelectronic, photonic, spintronic, and memory devices and their integrations. Papers are solicited in plasma etching and deposition of materials from low pressure to atmospheric plasmas, including the challenges in the formation of advanced gate and interconnection structures. Papers focusing on plasma processing for 3-D integration, such as through silicon via etch and high aspect ratio feature etch and deposition, are encouraged. Papers are also solicited in the fundamental understanding of plasma-surface and plasma-chamber wall interactions, in the use of gas-phase and surface diagnostics, sensors, modeling to elucidate and control a wide rage of plasma processes, and in the development of plasma sources, ranging from extreme ultraviolet sources to microplasmas and other novel systems. A special session on plasma enabled lithography will highlight the interplay between plasma processing and photolithography. In addition, Plasma Science and Technology solicits papers in three AVS-wide focused topics: photovoltaics (Energy Focus), plasmas for nanotechnology (Nanomanufacturing Focus), plasmas etching and deposition of soft materials and polymers and plasmas in biosciences and biomedicine (Biological, Organic, and Soft Materials Focus).

PS1 Plasma Etching for Advanced Interconnects
T. Chevolleau, LTM-CNRS, France, "Plasma Challenges of Porous SiOCH Patterning for Advanced Interconnect Levels"

PS2+NC Advanced Gate Etching
R. Turkot, Intel Corporation, "Etch Challenges at the 22nm Node and Beyond"

PS3 Fundamentals of Plasma and Surface Interactions
H.H. Sawin, Massachusetts Institute of Technology, "Three Dimensional Modeling of Surface Profile Evolution During Plasma Etching (Plasma Prize Lecture)"

PS4 Application of Plasma and Surface Interactions
D.B. Graves, University of California, Berkeley, "Synergistic Mechanisms of Plasma-Polymer Interactions"

PS5 Plasma and Chamber Wall Interactions

PS6 Plasma Deposition and Plasma Enhanced Atomic Layer Deposition and Etching
C. Hodson, Oxford Instruments Plasma Technology, UK, "High Quality Thin Films Deposited at Low Temperatures by Plasma Enhanced ALD and CVD Techniques"

PS7 Plasma Diagnostics, Sensors and Control
D. O'Connell, Ruhr-Universität, Germany, "Spatio-temporally Resolved Optical Emission Spectroscopy for Investigating Micro-discharges and rf Plasmas"

PS8 Plasma Sources
W. Holber, Energetiq Technology, Inc., "Generating Light from the DUV to the EUV and Soft X-Ray - Challenges and Applications"

PS9 Atmospheric Plasma Processing and Micro Plasmas
K. Tachibana, Kyoto University, Japan, "Microplasma Generation in Artificial High-density Media for Biomedical and Environmental Applications"

PS10 Plasma Processing for Photonics, Optoelectronics and Memory Devices

PS11 Plasma Modeling
A. Bogaerts, University of Antwerp, Belgium, "Computer Simulations for Processing Plasmas"

PS12 Plasma Processing for 3D Integration
R. Chebi, Lam Research Corporation, "Advancement and Characterization of 3D TSV Etch Applications"

PS13+NC Plasma-Enabled Lithography
K. Kumar, IBM, "Plasma-Lithography Interactions for Advanced CMOS Manufacturing (45nm and Beyond)"

PS14 Invited Highlights on Plasma-Surface Interactions - Honoring the Distinguished Career of Herbert H. Sawin (Invited Papers Only; Speakers Listed Alphabetically)
J. Coburn, University of California, Berkeley, "Plasma Etching - the Early Days"
T. Dalton, IBM, "Silicon Processing Technologies in Adjacent Spaces, Applications Beyond Information Technology"
V. Donnelly, University of Houston, "Will Recombination Reaction Probabilities at Plasma Chamber Walls Ever Be Non-adjustable Parameters?"
K. Giapis, Caltech, "Ion-Surface Interactions Beyond Etching"
R. Gottscho, Lam Research, "Plasma Etching - Where Are the Limits?"
O. Joubert, CNRS, France, "In Situ and Nanoscale Characterization of Plasma Processes to Reach New Frontiers in Plasma Etching"
M. Kushner, Iowa State University, "Predictions of Very High Aspect Ratio Profiles in Dual Frequency Plasma Etching Reactors"
T. Makabe, Keio University, Japan, "Predictive Etch Profile under Competition Among Deposition, Etching, and Charging on Dielectrics in a Low Temperature Plasma"
G. Oehrlein, University of Maryland, "Studies of Plasma-Polymer Interactions for Nanoscale Patterning of Materials"

PS15 Plasma Science and Technology Poster Session

BO1+PS+AS+BI+SS Plasma-deposited, Polymer and Organic Surfaces in Biological Applications
M. Alexander, The University of Nottingham, UK, "High Throughput Surface Chemical Analysis on Polymer Microarrays: Wettability, Protein Adsorption and Cell Response Correlations"
G. Bussetti, Johannes Kepler University, Austria
A. Fridman, Drexel University, "Plasma Medicine"

BO2+SS+AS+PS+NC Organized, Assembled and Structured Organic Interfaces
J. Laskin, Pacific Northwest National Laboratory, "Modification of Self-Assembled Monolayer Surfaces Using Hyperthermal Ion Beams"
A. Wendt, University of Wisconsin, "Plasma Etching for Selective Removal of PMMA from nm-scale PS/PMMA Block Copolymers for Lithographic Applications"
X. Zhang, Tsinghua University, China, "Inorganic Colloid-Polymer Organized Films with New Functions"

EN4+EM+NS+PS+TF+NC Photovoltaics
S. Siebentritt, University of Luxembourg, "Thin Film Preparation of Chalcopyrites for Solar Cells and Fundamental Material Physics"
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, "Thin Film Technologies for 1st, 2nd and 3rd Generation Solar Cells"

NM2+PS+NC Plasmas for Nanotechnology
U. Kortshagen, University of Minnesota, "Silicon Nanocrystal Inks: Plasma Processing as a Route to Solution-Processed Silicon Films"

Surface Science Division (SS)

Provides a forum for emerging research opportunities, fundamental research, and forefront analytical studies of surfaces and interfaces. Experimental, theoretical, and simulation techniques are developed and applied to discover fundamental scientific concepts of chemical and physical phenomena at surfaces and interfaces. This provides the foundation for studies of technologically relevant materials. Sessions address fundamental surface science issues pertaining to (i) surface reactions and catalysis (metals, hydrocarbons, clusters, and nanoparticles; (ii) surface processes (growth, etching, transport, and alloying); (iii) surface characterization (structure, morphology, electronic structure, vibrational spectroscopy); (iv) dynamics and stimulated processes at surfaces; (v) surface science of semiconductors [co-sponsored with EMPD]; (vi) oxide surface structure and reactivity, (vii) water-surface interactions; and (viii) environment surfaces [co-sponsored with ASSD]. The Surface Science Division is also collaborating on two AVS focus topics (Energy, and Biological, Organic, and Soft Materials) and two topical conferences (Graphene and Synchrotron Radiation).

SS1 Surface Reactions on Metals
J. Hrbek, Brookhaven National Laboratory, "Model Catalysts for Steam-reforming and Water-Gas Shift Reactions"

SS2 Catalytic Chemistry of Hydrocarbons
A.J. Gellman, Carnegie Mellon University

SS3+NC Catalysis on Clusters and Nanoparticles
H. Metiu, University of California at Santa Barbara, "Catalysis by Atomic-Size Centers"

SS4 Bimetallics and Alloys
D.W. Goodman, Texas A&M University

SS5+NC Surface Structure and Morphology
P.A. Thiel, Iowa State University and Ames Laboratory, "Additive-Enhanced Mass Transport on Metal Surfaces: Hunting Elusive Agents of Change"

SS6 Excitations at Surfaces and Nonequilibrium Effects
X.-Y. Zhu, University of Minnesota, "Charge Carrier Separation and Transport at Organic Semiconductor Interfaces"

SS7 Dynamics at Surfaces
A.M. Wodtke, University of California, Santa Barbara, "Excited Electrons in Interfacial Chemistry"

SS8 Electronic Spectroscopy
J. Osterwalder, Universität Zürich, Switzerland, "Quantitative Three-dimensional Spin-Polarimetry in ARPES"

SS9+EM+NC Semiconductor Surfaces
P. Soukiassian, Universite de Paris-Sud, Orsay and Commissariat a l'Energie Atomique, France, "Active Nano-objects and Nanochemistry at Silicon Carbide Surfaces"

SS10+NC Nucleation, Growth, and Etching on Surfaces
M.A. Hines, Cornell University, "Producing Ultraflat Si(100) Surfaces with Aqueous Etching: STM and FTIR Yield Mechanistic Insights"

SS11+NC Reactivity of Oxide Surfaces
H.-J. Freund, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany, "Metal Atoms and Aggregates Interacting with Thin Oxide Films"

SS12 Structure of Oxide Surfaces and Oxide Heterostructures
T. Risse, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany, "Tuning the Properties of Metals on Oxides: Au on MgO a Case Study"

SS13+NC Water-Surface Interactions
B.D. Kay, Pacific Northwest National Laboratory, "Structure and Kinetics of Nanoscale Amorphous and Crystalline Ice Films on Various Substrates"

SS14+AS Environmental Surfaces
K.M. Rosso, Pacific Northwest National Laboratory

SS15 Vibrational Spectroscopy
M. Havenith, Ruhr Universität-Bochum, Germany

SS16 Surface Science Poster Session

BO1+PS+AS+BI+SS Plasma-deposited, Polymer and Organic Surfaces in Biological Applications
M. Alexander, The University of Nottingham, UK, "High Throughput Surface Chemical Analysis on Polymer Microarrays: Wettability, Protein Adsorption and Cell Response Correlations"
G. Bussetti, Johannes Kepler University, Austria
A. Fridman, Drexel University, "Plasma Medicine"

BO2+SS+AS+PS+NC Organized, Assembled and Structured Organic Interfaces
J. Laskin, Pacific Northwest National Laboratory, "Modification of Self-Assembled Monolayer Surfaces Using Hyperthermal Ion Beams"
A. Wendt, University of Wisconsin, "Plasma Etching for Selective Removal of PMMA from nm-scale PS/PMMA Block Copolymers for Lithographic Applications"
X. Zhang, Tsinghua University, China, "Inorganic Colloid-Polymer Organized Films with New Functions"

EN1+SE+NS+SS+NC Hydrogen Storage
D. Mitlin, University of Alberta, Canada, "Light-Element Destabilized Mg-based Thin-Film Alloys for Hydrogen Storage"
P. Sutter, Brookhaven National Laboratory, "Atomistic Mechanisms of Reversible Hydrogen Storage in Complex Metal Hydrides"

EN6+BI+SS+SE Catalysis for Energy Sustainability
C.L. Marshall, Argonne National Laboratory, "Size, Shape, and Support Effects in Oxidative Coupling Reactions"
J.K. Norskov, Technical University of Denmark, "Understanding Trends in the Catalytic Activity of Transition Metals"

Thin Film Division (TF)

Solicits papers on fundamental and advanced topics in the synthesis, characterization, modeling, and applications of thin films. This year we will highlight the growing field of Atomic Layer Deposition (ALD) and papers focusing on applications, 3-D nanostructures, inorganic/organic Hybrid Materials, functionalization and surface chemistry, and plasma ALD are encouraged. Dedicated sessions include sessions on the growth, characterization, modeling and applications of thin films, and a special session on thin films for displays and flexible electronics are planned. Several joint thin film sessions with other divisions and topical conferences have also been arranged. Specifically a session is planned on Photovoltaics, Fuel Cells, and Alternative Energy Materials and Applications in the energy focus topic. A plasmonics session has been coordinated with the biomaterials interfaces division and a biomaterials and processing session has been organized in the biomems topical conference. A session on materials and processing via glancing angle and oblique angle deposition has been jointly developed with surface engineering. Finally, a topical conference on graphene encompassing growth, characterization and applications include has been developed. In addition to the above described oral sessions, poster presentations are also solicited in all aspects of thin film materials.

TF1+NC Atomic Layer Deposition on 3-D Nanostructures
K. Nielsch, University of Hamburg, Germany
M.J. Pellin, Argonne National Laboratory

TF2+NC Atomic Layer Deposition of Inorganic/Organic Hybrid Materials
J. Engstrom, Cornell University

TF3+NC Atomic Layer Deposition: Functionalization and Surface Chemistry

TF4 Applications of Atomic Layer Deposition
J. Kim, University of Dallas, Texas
C. Summers, Georgia Institute of Technology

TF5 Growth, Characterization, Modeling and Applications of Thin Films
K. Fichthorn, Penn State University
S. Ramanathan, Harvard University, "Synthesis and Functional Properties of Thin Film Oxides Synthesized under Photon Irradiation"

TF6 Thin Films for Displays and Flexible Electronics
R. Ma, Universal Display Corporation, "Thin Film Challenges for Flexible Displays and Electronics"

TF7 Aspects of Thin Films Poster Session

EN3+AS+EM+TF+VT+NC Electrochemical Storage
A.C. Dillon, National Renewable Energy Laboratory, "Metal Oxide Nanoparticles for Next-generation Li-ion Battery Electrodes"
L.F. Nazar, University of Waterloo, Canada, "Material Solutions for Solid State Energy Storage"

EN4+EM+NS+PS+TF+NC Photovoltaics
S. Siebentritt, University of Luxembourg, "Thin Film Preparation of Chalcopyrites for Solar Cells and Fundamental Material Physics"
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, "Thin Film Technologies for 1st, 2nd and 3rd Generation Solar Cells"

EN5+AS+TF+VT+NC Energy: Tools and Approaches
W.S. Sampath, Colorado State University, "Large Area Continuous In-Line Processing of CdTe Photovoltaics"
M. Yudaskaka, NEC, Japan, "Production and Application of Carbon Nanohorns"

NM3+TF+EM+NC Printable Lithography / Nanoimprint
J. Rogers, University of Illinois, Urbana-Champaign, "Printing Techniques for Electronics"

TR2+SE+TF Advances in Surface Engineering for Friction and Wear Control
A. Cavaleiro, University of Coimbra, Portugal, "Latest Developments on the Family of C-alloyed TMD Self-lubricating Coatings"

Vacuum Technology Division (VT)

Program will focus on vacuum surface interactions such as cleanliness, outgassing, contamination, tribological issues in vacuum and ion/neutral motion in transition flow. We will also highlight vacuum pumping technologies, including active surface pumping (gettering), miniature, portable and novel vacuum technology. Our call for papers includes sessions on gauging, calibration and leak detection. We welcome papers that address the need for vacuum in miniature environments. We also examine the other end of the size spectrum, looking at the issues of large vacuum systems, including particle accelerators and production equipment. As photovoltaics manufacture is poised to enter mass production, we welcome papers on the unique challenges of scaling up from small- to large-scale manufacturing of these thin-film compound semiconductor devices. We will have a poster session, where all vacuum technology topics are welcome. The VTD will continue its poster competition for Student-Built Vacuum Systems, which includes a cash prize (for more information, contact Tim Gessert, tim_gessert@nrel.gov). Submissions are welcome for the following sessions

VT1 Vacuum Surface Interactions: Cleanliness, Outgassing, Contamination and Tribological Issues in Vacuum Environments
J.D. Herbert, Daresbury Laboratory, UK, "A Review of the Development of Cleaning Processes and Cleanliness Assessment at Daresbury Laboratory"

VT2 Pumping Technologies, Including Active Surface Pumping (Gettering), Portable, Novel and Miniature Vacuum Technology
A Conte, SAES Getters SpA, Italy, "Sorption Properties of Non Evaporable Getter Pumps for Selected Hydrocarbons and Organic Compounds"

VT3 Large Vacuum Systems, Including Accelerators, Production Equipment and Photovoltaic Production
J.M. Jimenez, CERN, Switzerland, "LHC Beam & Insulation Vacuum Systems"

VT4 Gauging, Calibration, and Leak Detection
K.H. Chung, Korean Research Institute of Standards and Science, "Vacuum Metrology in Korea: Value Innovation for Customers"

VT5 Vacuum Technology Poster Session, Including Student Poster Competition

EN3+AS+EM+TF+VT+NC Electrochemical Storage
A.C. Dillon, National Renewable Energy Laboratory, "Metal Oxide Nanoparticles for Next-generation Li-ion Battery Electrodes"
L.F. Nazar, University of Waterloo, Canada, "Material Solutions for Solid State Energy Storage"

EN5+AS+TF+VT+NC Energy: Tools and Approaches
W.S. Sampath, Colorado State University, "Large Area Continuous In-Line Processing of CdTe Photovoltaics"
M. Yudaskaka, NEC, Japan, "Production and Application of Carbon Nanohorns"

TR4+VT Effects of Vacuum on Tribological Properties and Measurement
J. Lince, The Aerospace Corporation

NANO-Content Sessions

AS1+NC Electron Spectroscopies
J. Watts, University of Surrey, UK, "Probing the Interfacial Chemistry of Polymer-Metal Systems with Electron Spectroscopy"

BI1+SS+NC Honorary Session for Bengt Kasemo
F. Besenbacher, University of Aarhus, Denmark, "SPM Studies of DNA Building Blocks on Surfaces"
A. Brisson, University of Bordeaux, France, "2D Self-assembly of Proteins on Lipid Surfaces: From Biological Function to Biotechnological Applications"
C. Frank, Stanford University, "Interaction of AH Amphipathic Peptide with Lipid Bilayers and Application to the Understanding of Hepatitis C Viral Infection via QCM-D Measurements"
B. Kasemo, Chalmers University of Technology, Sweden, "From Surface Science to Biointerface Science and Back Again"
W. Knoll, MPIP, Mainz, Germany, "The Tethered Bimolecular Lipid Membrane as a Novel Model Membrane Platform"

BI2+NC Quantitative Nanoscale Sensing and Single Molecule Techniques
A. Armani, California Institute of Technology, "Biophotonics: Resonant Detection of Single Molecules"
D. Klenerman, Cambridge University, UK, "Single Molecules on Living Cells"

BI6+TF+MI+NS+NC Plasmonics and Magneto/Plasmonics Aimed at Bio-Sensing
C. Clavero, College of William and Mary, "Developments in Magneto/Plasmonic Devices"
A. Lazarides, Duke University, "Energy Transport in Nanoparticle Systems/Theory"
X. Zhang, University of California, Berkeley, "Plasmonic Fabrication"

BM1+NC Diagnostics for System Microbiology and Medical
R. Bashir, University of Illinois, Urbana-Champaign, "Interfacing Micro and Nanotechnology with Biology and Medicine: Opportunities and Prospects"
D.W. Grainger, University of Utah, "Understanding the DNA Analyte Surface Capture Process and Limitations in DNA Microarray Assays"
M. Paulaitis, Ohio State University, "High Throughput Microarrays for Characterizing Diverse T-cell Populations"

BM3+NC Materials and Processing
C. Gerber, University of Basel, Switzerland, "Cantilever Based Sensing"
K.F. Jensen, Massachusetts Institute of Technology, "Microbial Cells in Microfluidic Systems"
M.J. Madou, University of California, Irvine, "Molecular Diagnostics on a Compact Disc"
D. Polla, DARPA, "BioMEMS Challenges and Opportunities - A Department of Defense Perspective"

BO1+PS+AS+BI+SS+NC Plasma-deposited, Polymer and Organic Surfaces in Biological Applications
M. Alexander, The University of Nottingham, UK, "High Throughput Surface Chemical Analysis on Polymer Microarrays: Wettability, Protein Adsorption and Cell Response Correlations"
G. Bussetti, Johannes Kepler University, Austria
A. Fridman, Drexel University, "Plasma Medicine"

BO2+SS+AS+PS+NC Organized, Assembled and Structured Organic Interfaces
J. Laskin, Pacific Northwest National Laboratory, "Modification of Self-Assembled Monolayer Surfaces Using Hyperthermal Ion Beams"
A. Wendt, University of Wisconsin, "Plasma Etching for Selective Removal of PMMA from nm-scale PS/PMMA Block Copolymers for Lithographic Applications"
X. Zhang, Tsinghua University, China, "Inorganic Colloid-Polymer Organized Films with New Functions"

BO3+AS+BI+NC Advances in Surface Analysis of Organic and Biological Interfaces
H. Nygren, Göteborg University, Sweden, "Analysis of Biological Samples by TOF-SIMS"

BO4+EM+BI+NC Semiconducting Biointerfaces and Sensors
W. Lu, The Ohio State University, "Biosensors from GaN Nanowires and Transistors"
BO5+NS+BI+NC Biological and Molecular Applications of Nanostructures
J. Spatz, Max Planck Institute for Metals Research, Germany, "Nanoscopic Presentation of Peptides at Cell Interfaces"

EN1+SE+NS+SS+NC Hydrogen Storage
D. Mitlin, University of Alberta, Canada, "Light-Element Destabilized Mg-based Thin-Film Alloys for Hydrogen Storage"
P. Sutter, Brookhaven National Laboratory, "Atomistic Mechanisms of Reversible Hydrogen Storage in Complex Metal Hydrides"

EN2+NS+NC Efficient Energy Utilization
P. Hammond, Massachusetts Institute of Technology, "Layer-By-Layer Approaches to Electrochemical Energy and Storage"
C.-F. Lin, National Taiwan University, "Nano-Structured Semiconductors for Better Efficiency of Solar Cells"

EN3+AS+EM+TF+VT+NC Electrochemical Storage
A.C. Dillon, National Renewable Energy Laboratory, "Metal Oxide Nanoparticles for Next-generation Li-ion Battery Electrodes"
L.F. Nazar, University of Waterloo, Canada, "Material Solutions for Solid State Energy Storage"

EN4+EM+NS+PS+TF+NC Photovoltaics
S. Siebentritt, University of Luxembourg, "Thin Film Preparation of Chalcopyrites for Solar Cells and Fundamental Material Physics"
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, "Thin Film Technologies for 1st, 2nd and 3rd Generation Solar Cells"

EN5+AS+TF+VT+NC Energy: Tools and Approaches
W.S. Sampath, Colorado State University, "Large Area Continuous In-Line Processing of CdTe Photovoltaics"

GR1+TF+NC Graphene: Characterization, Properties, and Application
L.C. Chen, National Taiwan University, "Wafer-Scale Synthesis and Electrochemical Property of Graphene formed by Microwave Plasma Enhanced CVD"
A. Geim, University of Manchester, UK, "Graphene: Exploring Carbon Flatland"

GR2+TF+NC Graphene and 2-D Carbon Nanostructures
M. Chhowalla, Rutgers University, "Thin Film Electronics from Solution Processed Reduced Graphene Oxide"
Y. Wu, National University of Singapore, "Electrical Transport Properties of Two-Dimensional Carbon Nanostructures"

GR3+EM+NC Graphene and Carbon Electronics
K.J. Cho, University of Texas at Dallas, "Computational Modeling of Graphene"
K. Bolotin, Prof. Philip Kim Research Lab, Columbia University, "Toward Carbon Based Electronics"

GR4+SS+NC Materials Issues in Graphene from SiC
P. First, Georgia Institute of Technology, "Layer-dependent Properties of Epitaxial Graphene on Silicon Carbide"
G. Jernigan, US Naval Research Laboratory, "Large-Scale Synthesis of Graphene"

IS2+NC In Situ Electron Microscopy - Structure Property Characterization
F.M. Ross, IBM, "Kinetics of Individual Nucleation Events during Vapor-Liquid-Solid Growth"
J.C. Yang, University of Pittsburgh, "The Dynamics of the Initial Oxidation Stages of Cu and Cu Alloys"

IS3+TR+NC In Situ Electron Microscopy - Dynamic Nanoscale Processes
R. Sharma, Arizona State University, "Dynamic Observations of Synthesis and Functioning of Nanostructured Materials"
E.A. Stach, Purdue University, "Environmental Cell Transmission Electron Microscopy Studies of
Catalysis and Catalyzed Nanostructure Growth"
Z.L. Wang, Georgia Institute of Technology, "In Situ Nanomechanics"

IS4+NC In Situ Electron Microscopy - Interfacial Chemistry/Catalysis
A. Datye, University of New Mexico, "Dynamics of Catalytic Nanoparticles"
H. Saka, Nagoya University, Japan, "In Situ Transmission Electron Microscopy of Solid-Liquid Interfaces"

MI1+NC New Directions in Spintronics
- A. Fert, Unité Mixte de Physique CNRS/Thales, France, "Spin Transport between Spin-Polarized Sources and Drains: Advantage of Carbon Nanotubes on Semiconductors"
- J. Moodera, Massachusetts Institute of Technology, "Spin Tunneling and Transport through Organic Semiconductors - Towards Large Spin Relaxation Length"
- B. Pratt, Michigan State University, "Current Perpendicular to Plane Giant Magnetoresistance in Magnetic Multilayers"
- C. Ross, Massachusetts Institute of Technology, "Magnetism and Magnetoresistance in Multilayer Thin Film Rings"

MI2+NC Magnetic Spectroscopy and Imaging, Spin Polarized Scanning Tunneling Microscopy, Manipulation of Magnetic Atoms and Molecules
- A. Heinrich, IBM Research Division, "Probing Individual Magnetic Nanostructures with Spin Excitation Spectroscopy"
- K. von Bergmann, University of Hamburg, Germany, "Complex Magnetic Order on the Atomic Scale Revealed by SP-STM"

MI3+NC Organic Spintronics and Magnetic Sensors
- A. Caruso, North Dakota State University, "Organic-based Magnetoelectronics from an Electronic Structure View"

MI4+NC Magnetic Surfaces, Interfaces, Thin Films, Heterostructures and Nanoparticles
- S. Majitec, Carnegie Mellon University, "Nanomasking of Magnetic Thin Films with Nanoparticles"

MI5+NC Magnetization and Domain Wall Dynamics, Spin Injection, Magnons and Magneto Optics
- T. Mewes, University of Alabama, "Magnetization Damping in Magnetic Multilayers"

MN2+NC Fabrication at the Micro- and Nano- Scales for MEMS/NEMS
- L. Ocola, Argonne National Laboratory

MS1+NC CMOS Manufacturing: Present and Future
- B. Doris, IBM Research, "32 nm CMOS and Beyond"

MS2+NC Metrology in Nano-manufacturing
- E. Zschech, AMD, Germany, "From Lab to Fab - Integration of Analysis and Metrology for Future Technology Nodes"

NM1+NS+MS+NC Manufacturing of Nanostructures
- M. Bawendi, Massachusetts Institute of Technology, "Semiconductor Nanocrystals (aka Q Dots)"
- P. Ferreira, University of Illinois, Urbana-Champaign, "Patterned Electrochemical Ion-Etching"
- L. Samuelson, Lund University, Sweden, "Nanowires"

NM2+PS+NC Plasmas for Nanotechnology
- U. Kortshagen, University of Minnesota, "Silicon Nanocrystal Inks: Plasma Processing as a Route to Solution-Processed Silicon Films"

NM3+TF+EM+NC Printable Lithography / Nanoimprint
- J. Rogers, University of Illinois, Urbana-Champaign, "Printing Techniques for Electronics"

NM4+AS+NC Nanomaterial Metrology
- G. Gross, Boeing, "Practical Considerations for Implementation of Nanomaterials in Aerospace"

NM5+MS+NC Beyond CMOS Nanoelectronics
- M. Fuhrer, University of Maryland, "Intrinsic and Extrinsic Limits of Charge Carrier Mobility in Graphene"
- V. LaBella, University of Albany, "Semiconductor Based Spintronic Structures: Challenges and Opportunities (at INDEX)"
- J. Lee, University of Albany, "Excitonic Circuits for Post-CMOS Applications (at INDEX)"
- A. MacDonald, University of Texas, Austin, "Graphene Electronic Devices"

NS1+NC Characterization and Imaging of Nanostructures
- M. Bode, Argonne National Laboratory, "Spin Polarized STM"

NS2+NC Nanolithography
- R. Ruiz, Hitachi Global Storage Technologies, "Pattern Error Correction by Lithographically Guided Self Assembly"

NS3+NC Nanoscale Assembly
- P.F. Nealey, University of Wisconsin, Madison

NS4+NC Nanoscale Manipulation
- L. Wan, The Chinese Academy of Sciences, "Characterization, Manipulation, and Fabrication with an STM"

NS5+NC Nanoscale Devices and Sensors
- B. Lim, Atomate, "CNTFET: Carbon Nanotube Power Transistors"

NS6+NC Nanoscale Processes
- L. Pfefferle, Yale University, "Ultra High Quality CNT Processing"

NS7+NC The Frontiers of Nanoscience
- D. Allara, Penn State University
- S. Morita, Osaka University, Japan, "Atomic Resolution AFM"
- G.M. Whitesides, Harvard University
- S. Williams, Hewlett-Packard Laboratories, "Memristive Switching, Memory and Logic at the Nanoscale"

PS2+NC Advanced Gate Etching
- R. Turkot, Intel Corporation, "Etch Challenges at the 22nm Node and Beyond"

PS13+NC Plasma-Enabled Lithography
- K. Kumar, IBM, "Plasma-Lithography Interactions for Advanced CMOS Manufacturing (45nm and Beyond)"

SE1+NC Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties
- G.C.A.M. Janssen, Delft University, The Netherlands, "Stresses in Hard Coatings"
- J.-P. Riviera, Universite de Poitiers - UFR Sciences - SP2MI, France, "Structural Development and Mechanical Properties of TiN-Ni Nanocomposite Coatings"

SE3+TF+NC Glancing Angle Deposition
- A. Lakhtakia, Pennsylvania State University, "Sculptured Thin Films: Something Old, Something New, Something Borrowed, Something Blue"
- Y. Zhao, University of Georgia, "Glancing Angle Deposition at the Nano-Bio Interface"

SS3+NC Catalysis on Clusters and Nanoparticles
- H. Metiu, University of California at Santa Barbara, "Catalysis by Atomic-Size Centers"

SS5+NC Surface Structure and Morphology
- P.A. Thiel, Iowa State University and Ames Laboratory, "Additive-Enhanced Mass Transport on Metal Surfaces:  Hunting Elusive Agents of Change"
- J. Osterwalder, Universität Zürich, Switzerland, "Quantitative Three-dimensional Spin-Polarimetry in ARPES"

SS9+EM+NC Semiconductor Surfaces
- P. Soukiassian, Universite de Paris-Sud, Orsay and Commissariat a l'Energie Atomique, France, "Active Nano-objects and Nanochemistry at Silicon Carbide Surfaces"

SS10+NC Nucleation, Growth, and Etching on Surfaces
- M.A. Hines, Cornell University, "Producing Ultraflat Si(100) Surfaces with Aqueous Etching: STM and FTIR Yield Mechanistic Insights"

SS11+NC Reactivity of Oxide Surfaces
- H.-J. Freund, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany, "Metal Atoms and Aggregates Interacting with Thin Oxide Films"

SS13+NC Water-Surface Interactions
- B.D. Kay, Pacific Northwest National Laboratory, "Structure and Kinetics of Nanoscale Amorphous and Crystalline Ice Films on Various Substrates"

SY1+SS+BI+NC Synchrotron-based Spectroscopy and Spectro-Microscopy
- C. Heske, University of Nevada, "X-ray Emission from Solutions"
- A. Hitchcock, McMaster University, Canada, "Soft X-ray Spectromicroscopy of Protein and Peptide Interactions with Polymer Surfaces"
- A. Kira, SPring-8, Japan
- M. Kiskinova, Elettra, Trieste, Italy, "Chemical Imaging and Spectroscopy at Sufficiently High Spatial Resolution to Uncover Functions of Nanoscale Phenomena"
- R. Lamb, Australian Synchrotron "The Brightest Light Downunder - Australian Synchrotron Update"
- A. Nilsson, SSRL/Stanford University, "The Structure of the Hydrogen Bonding Network in Liquid Water and Aqueous Solutions"
- A. Perucchi, Elettra, Trieste, Italy, "Recent Advances in Material Research with Synchrotron Infrared Spectromicroscopy at Elettra"
- W. Wurth, DESY Hamburg, Germany, "FLASH"
- M. Zharnikov, Universität Heidelberg, Germany, " High-Resolution X-Ray Photoelectron Spectroscopy as a Versatile Tool for the Characterization of Monomolecular Self-Assembled Films"

TF1+NC
Atomic Layer Deposition on 3-D Nanostructures
- K. Nielsch, University of Hamburg, Germany
- M.J. Pellin, Argonne National Laboratory

TF2+NC Atomic Layer Deposition of Inorganic/Organic Hybrid Materials
- J. Engstrom, Cornell University

TF3+NC Atomic Layer Deposition: Functionalization and Surface Chemistry

TR1+EM+NS+NC Nanotribology and Nanomechanics
- G. Haugstad, University of Minnesota, "Frictional and Transverse Shear Forces as Probes of Disorder and Anisotropy in Organic Semiconductors"

TR3+MN+NC Surfaces and Interfaces in MEMS/NEMS
- D.W. Brenner, North Carolina State University

AVS