• Advanced Surface Engineering
• Applied Surface Science
• Biomaterial Interfaces
• Electronic Materials & Processing
• Magnetic Interfaces & Nanostructures
• MEMS & NEMS
• Manufacturing Science & Technology
• Nanometer-scale Science & Technology
• Plasma Science & Technology
• Surface Science
• Thin Film
• Vacuum Technology
  

 

Advanced Surface Engineering Division (SE)

The Advanced Surface Engineering Division (SE) program serves scientists and technologists interested in new materials, technologies, characterization, manufacturing, applications, and fundamentals of surface engineering. The sessions focus on the basics and use of atmospheric pressure plasmas, new developments in hard and nanostructured coatings, the possibilities of glancing angle deposition, novelties in pulsed plasma processes for surface engineering and innovations in surface engineering for thermal managements. In conjunction with the Thin Films Division (TF) a wide range of aspects in tribology are covered in joint sessions. Under these topics, presentations on novel coating materials, processes to prepare them, design and modeling, diagnostics and growth control, mechanical property characterizations, resistance to severe conditions, thermal stability and other aspects related to surface engineering and coatings are solicited.

• SE1+PS  Atmospheric Pressure Plasmas
  Claus-Peter Klages, Fraunhofer-Institut für Schicht- und Oberflächentechnik, Germany, “Atmospheric-pressure Plasma Activation of Silicon and Glass Surfaces for Low-Temperature Direct Bonding”
  

• SE2  Hard and Nanostructured Coatings
  Helmut Rudigier, Oerlikon Balzers AG, Liechtenstein, “PVD-Oxide Coatings for Tribological Applicationns”
  

• SE3+TF  Glancing Angle Deposition (GLAD)
  Daniel Gall, Rensselaer Polytechnic Institute, “Nanorods by Extreme Shadowing: New Pictures and New Physics”
  

• SE4+PS  Pulsed Plasmas in Surface Engineering
  Kostas Sarakinos, Linköping University, Sweden, "High Power Impulse Magnetron Sputtering (HiPIMS) for the Deposition of Functional Nanocrystalline and Amorphous Films"
  

• SE5  Surface Engineering for Thermal Management
  Douglas Dudis, Air Force Research Laboratory, "Surface Engineering for Thermoelectric Energy Conversion"
  
  William King, UIUC, "Surface Thermal Transport and Thermal Property Characterization at the Micro and Nanoscale"
  

• SE6  Advanced Surface Engineering Division Poster Session
  

• TR1+SE  Advances in Surface Engineering for Friction and Wear Control
  David Schall, Oakland University, "Mechanical and Tribological Properties of Si-doped Amorphous Carbon Films"
  

• TF13+SE  Glancing Angle Deposition (GLAD)
  Melik Demirel, Penn State University

 

Applied Surface Science Division (AS)

The use of surface analysis methods in understanding surface and interfacial properties is essential in order to solve materials challenges in the fields of energy, semiconductor processing, nanoscience and biotechnology. The Applied Surface Science Division welcomes original work in applied research of surfaces and interfaces, including traditional sessions on electron spectroscopies, all aspects of surface mass spectrometry, surface and interface imaging, and instrument automation and data processing. There will also be a session on new ion beam technologies for imaging, sample preparation, and analysis, and we welcome practical and applied surface analysis work, particularly with an emphasis on forensics and failure analysis. ASSD is proud to co-sponsor several topical conferences and focus topics joint with other divisions including spectroscopic ellipsometry, surface and interface analysis for energy and graphene materials, and surface analysis in liquids. Several joint sessions, with other divisions, will focus on techniques for biointerface and biomaterials analysis, near field super resolution microscopy, characterization and imaging at the nanoscale including the use of scanning probes, and characterization of inkjet printing. Finally, our annual poster session will cover all aspects of applied surface science. Students are encouraged to participate in the student presentation competition; both posters and oral presentations will be allowed.

• AS1   New Ion Beam Technologies for Imaging, Sample Preparation and Analysis
  Noel Smith, Oregon Physics
  

• AS2   Forensics, Failure Analysis, and Practical Surface Analysis
  Christine Mahoney, National Institute of Standards and Technology
  

• AS3   Electron Spectroscopies
  Cedric Powell, National Institute of Standards and Technology, “Recent Developments in Quantitative XPS and AES”
  

• AS4   Surface Mass Spectrometry: SIMS and Beyond
  
  

• AS5   Advanced Automation and Data Processing
  Michael Keenan, Consultant, "Strategies for Multivariate Analysis of Very Large Spectral Images"
  

• AS6    Advances in Surface and Interface Imaging
  Brian Gorman, Colorado School of Mines
  

• AS7    Applied Surface Science Division Poster Session
  

• BI8+AS  Integrating Techniques for Biointerface Analysis
  DaeWon Moon, Korea Research Institute of Standards and Science, Republic of Korea, "Integration of Laser and Mass Spectrometric Imaging for Cardiovascular Researches"
  

• BI9+AS  Near Field and Super Resolution Microscopy
  

• EL1+AS+EM+MS+TF  Spectroscopic Ellipsometry I
  Mathias Schubert, University of Nebraska, Lincoln, "New Developments in Spectroscopic Ellipsometry for Characterization of Organic and Inorganic Surfaces, Interfaces and Complex Layered Materials"
  

• EL2+AS+EM+MS+TF  Spectroscopic Ellipsometry II
  Herbert Wormeester, University of Twente, The Netherlands, "Roughness beyond Bruggeman's Effective Medium Approximation"
  

• EL3+AS+EM+MI+MS+TF  Spectroscopic Ellipsometry III
  

• EL4+AS+EM+MS+TF  Spectroscopic Ellipsometry Focus Topic Poster Session
  

• EN12+AS  Surface and Interface Analysis of Materials for Energy
  

• GR6+AS+TF  Graphene: Surface Characterization
  Regis Decker, University of California Berkeley, "Local Probe Investigation of Transition Metal Atoms on a Gated Graphene Device"
  

• GR7+AS+TF  Graphene Synthesis on Metals
  Thomas Michely, University of Cologne, Germany, "From Perfect Graphene to Cluster Superlattices"
  
  Peter Sutter, Brookhaven National Laboratory, "Transition Metal Catalyzed Graphene"
  

• IS3+AS+NS In Situ Spectroscopy/Microscopy – In Situ Nanoscale Processes
  Jeffery Drucker, Arizona State University, “Au on Vapor-Liquid-Solid Grown Si Nanowires: Spreading of the Liquid Metal Seed
  
  John Cumings, University of Maryland, “In Situ TEM Studies of Nanomagnetism and Thermal Transport”
  

• IS4+AS+BI In Situ Spectroscopy/Microscopy – Biological Interfaces
  Tim Salditt, Universität Göttingen, Germany, “Coherent X-ray Imaging of Biological Cells: Towards High Resolution and Quantitative Contrast”
  
  Rainer Dahint, University of Heidelberg, Germany, "Proteins and Lipids at Liquid/Solid Interfaces:  In Situ Studies by Neutron Reflectometry and Infrared Spectroscopy"
  

• MB3+AS  Surface Analysis in Liquids
  Kathryn Wahl, Naval Research Laboratory, "Interfacial Spectroscopy: In situ Approaches to Understand Adhesion in Marine Environments"
  

• NS6+AS+MN  Characterization and Imaging at Nanoscale (Force Mapping)
  Roland Wiesendanger, University of Hamburg, Germany, "Atomic-resolution Spin Mapping at Oxide Surfaces by Exploiting Magnetic Exchange Forces"

Biomaterial Interfaces Division (BI)

In the tradition of the Biomaterial Interfaces Division (BI), a broad technical program has been established that is focused on progress in biointerface science and engineering and that brings together an interdisciplinary group of experts that work at the intersection of biosurface and interface science, the nanosciences, and biomedical engineering. The meeting will commence on Sunday afternoon with the Biomaterials Plenary (BP). With the theme Detecting, Characterizing and Controlling Biofouling, this year’s plenary aims to bring the AVS community together to explore the challenges involved with biofouling across the disciplines. The three plenary speakers will address a range of interconnected themes, marine biofouling, biofilm formation on biomaterials and biomolecule adsorption at surfaces. The BID technical program for the week incorporates classical topics such as Cell and Bacterial Interactions at Interfaces, Protein, peptide, enzyme and sugar interactions at interfaces, Sensors and Fluidics for Biomedical Applications, Characterization of Biointerfaces and Replicating Biological Environments. These sessions address issues relating to the fabrication, characterization and modeling of the biointerface as well as the translation of this knowledge into applications. Additionally, new innovations and recent trends are covered in the session Quantitative Sensing Biosurfaces and Interfaces.

• BI1 Bacterial Interactions at Interfaces
  Hans Griesser, Ian Wark Research Institute, Australia
  

• BI2 Cell Interactions at Interfaces
  Heather Canavan, University of New Mexico
  

• BI3 Biomolecules at Interfaces
  Daniel Ratner, University of Washington, “Characterizing Carbohydrate-Modified Surfaces: Advancing the Glycomics Paradigm“
  

• BI4 Proteins at Interfaces
  Martin Malmsten, Uppsala University, Sweden, “Interaction of Amphiphilic Antimicrobial Peptides with Phospholipid Membranes, Bacteria, and Cells”
  

• BI5 Replicating Biological Environments and Processes
  Marcus Textor, ETH Zurich, Switzerland, “Engineering Cell Behavior in Microfabricated Substrates: Adding Dimensionality to the Sensory Toolbox”
  

• BI6+NS  Quantitative Sensing at Biointerfaces
  Andrew Shreve, Los Alamos National Laboratory
  

• BI7 Sensors and Fluidics for Biomedical Applications
  Conrad James, Sandia National Laboratories
  

• BI8+AS  Integrating Techniques for Biointerface Analysis
  DaeWon Moon, Korea Research Institute of Standards and Science, Republic of Korea, "Integration of Laser and Mass Spectrometric Imaging for Cardiovascular Researches"
  

• BI9+AS  Near Field and Super Resolution Microscopy
  

• BI10 Biomaterial Interfaces Division Poster Session
  

• IS4+AS+BI In Situ Spectroscopy/Microscopy – Biological Interfaces
  Tim Salditt, Universität Göttingen, Germany, “Coherent X-ray Imaging of Biological Cells: Towards High Resolution and Quantitative Contrast”
  
  Rainer Dahint, University of Heidelberg, Germany, "Proteins and Lipids at Liquid/Solid Interfaces:  In Situ Studies by Neutron Reflectometry and Infrared Spectroscopy"
  

• NS2+BI  Biomolecular Templates & Bioinspired Nanomaterials
  Henry Hess, Columbia University, "Molecular Shuttles for 'Smart Dust' Biosensors, Active Self-Assembly, and Protein-Resistant Coatings"

  
   

Electronic Materials and Processing Division (EM)

The Electronic Materials and Processing Division (EM) sponsor sessions on electronic materials growth, processing, and characterization. The technical sessions and posters cover recent advances in contacts to semiconductors and nanostructures, defects in semiconductors, molecular electronics, highly correlated oxides and nitrides, solid state lighting, high dielectric constant materials and interfaces, and high conductivity substrates. The Division is co-sponsoring special topic sessions on electronic materials for energy conversion, spectroscopic ellipsometry, and graphene and carbon-based devices, as well as joint sessions focused on spintronics, photonic and plasmonic materials and devices, and control of interfacial properties.

• EM1  High k-Oxides and High Mobility Substrates
  Jesus del Alamo, Massachusetts Institute of Technology, "III-V CMOS: A sub-10 nm Electronics Technology?"
  

• EM2+MI  Semiconducting and Highly Correlated Oxides and Nitrides
  Harold Y. Hwang, University of Tokyo, Japan, "Oxide Superconducting Semiconductors"
  

• EM3  Molecular and Organic Electronics
   

• EM4  Contacts and Interfaces in Semiconductors and Nanostructures
  Martin Allen, University of Canterbury, New Zealand, "Influence of Spontaneous Polarization and Intrinsic Gap States on Schottky Contacts to ZnO"
  

• EM5  Solid State Lighting
  Russell D. Dupuis, Georgia Tech, "Recent Advances in the MOCVD Growth of III-N Light Emitting Devices"
  

• EM6  Defects in Semiconductors
  Irina Buyanova, Linköping University, Sweden, "Identification of the Dominant Recombination Centers in Dilute Nitrides"
  
  Yu Jin, University of Michigan, "Influence of N-induced Point Defects on the Electronic Properties of Dilute Nitride GaAsN Alloys"
  

• EM7  Electronic Materials and Processing Division Poster Session
  

• EL1+AS+EM+MS+TF  Spectroscopic Ellipsometry I
  Mathias Schubert, University of Nebraska, Lincoln, "New Developments in Spectroscopic Ellipsometry for Characterization of Organic and Inorganic Surfaces, Interfaces and Complex Layered Materials"
  

• EL2+AS+EM+MS+TF  Spectroscopic Ellipsometry II
  Herbert Wormeester, University of Twente, The Netherlands, "Roughness beyond Bruggeman's Effective Medium Approximation"
  

• EL3+AS+EM+MI+MS+TF  Spectroscopic Ellipsometry III
  

• EL4+AS+EM+MS+TF  Spectroscopic Ellipsometry Focus Topic Poster Session
  

• EN11+EM  Electronic Materials for Energy Conversion & Storage
  Anne Dillon, National Renewable Energy Laboratory
  
  Matt Law, University of California, Irvine , "Thin Film Photovoltaics from Nanocrystal Inks"
  

• GR4+EM+MS+TF  Graphene and Carbon-based Devices
  Emanuel Tutuc, University of Texas, Austin, “Electron Transport in Dual-Gated Mono- and Bilayer Graphene Devices with High-k Dielectrics”
  

• MI1+EM  Spintronics
  Philippe Debray, University of Cincinnati
  

• NS9+EM+EN  Photonic and Plasmonic Materials and Devices
  Teri Odom, Northwestern University, "Unconventional and Broadband Plasmonics"
  

• SS5+EM  Semiconductor Surfaces and Interfaces
  Anton Van der Ven, University of Michigan
  

• TF11+EM  Next Generation Processing
  Rudi Hendel, Periodic Structures, Inc., "Moore's Law - from Simple Scaling to Materials Driven"
  

• TF12+EM  Control of Interfacial Properties
  Peide (Peter) Ye, Purdue University, "High-k III-V MOSFETs Enabled by Atomic Layer Deposition"

• SS1  Structure of Oxide Surfaces
  Christof Wöll, Karlsruher Institut für Technologie (KIT), Germany
  

• SS2  Reactivity of Oxide Surfaces
  Charles Peden, Pacific Northwest National Laboratory,"Adsorption and Reactions on Poorly Crystalline γ–Al2O3 Surfaces"
  

• SS3  Semiconductor Interface Formation
  Roy Clarke, University of Michigan
  

• SS4  Compound Semiconductor Surfaces
  Stanislaw Krukowski, Polish Academy of Sciences, Poland
  

• SS5+EM  Semiconductor Surfaces and Interfaces
  Anton Van der Ven, University of Michigan
  

• SS6  Surface Dynamics and Atomically Precise Molecular Chemistry
  Josh Ballard, Zyvex Labs
  

• SS7  Nucleation and Growth
  Charles Campbell, University of Washington
  

• SS8  Environmental Interfaces
  Gordon Brown, Stanford University
  

• SS9  Catalytic and Electronic Properties of Nanoclusters
  Ib Chorkendorff, Danish Technical University, Denmark
  

• SS10   Surface Reactions and Catalysis I
  Cynthia Friend, Harvard University
  

• SS11   Surface Reactions and Catalysis II
  Francisco Zaera, University of California at Riverside
  

• SS12   Frontiers of Surface Imaging and Dynamics
  Gerhard Meyer, IBM Zurich Research Laboratory, Switzerland
  

• SS13   Latest Developments of In Situ Characterization Methods of Nanocatalysts "at work"
  Anatoly Frenkel, Yeshiva University
  

• SS14  Electron, Photon and Ion Beam Induced Surface Modification
  Phillip Rack, University of Tennessee, "Focused Electron Beam Induced Processing: Experiments, Simulations, and Applications"
  

• SS15  Organic Functionalization of Surfaces
  John Anthony, University of Kentucky, "Relating Aromatic Molecule Synthesis to Film Structure/Property Relationships"
  

• SS16    Surface Science Division Poster Session
  

• AC3+SS  Surface Science of Actinides and Rare Earths
  John Joyce, Los Alamos National Laboratory, "Electronic Structure of Pu Materials from Angle-resolved Photoemission"
  

• EN4+SS  Photocatalysis and Solar Fuels
  

• EN7+SS  Transparent Conductors
  Russel Egdel, University of Oxford, UK
  

• EN10+SS  Fundamentals of Charge Separation for Energy Applications
  John Asbury, Pennsylvania State University
  

• GR3+SS+TF  Epitaxial Graphene on SiC
  Thomas Seyller, The University of Erlangen-Nürnberg, Germany, "Epitaxial Graphene on SiC"
  

• IS1+SS In Situ Spectroscopy – Interfacial Chemistry/Catalysis
  Hendrik Bluhm, Lawrence Berkeley National Laboratory, "Photoelectron Spectroscopy Under Humid Conditions"
  
  Wolfgang Drube, HASYLAB, Germany. “Hard X-ray Photoelectron Spectroscopy: An Effective Probe for Electronic Structure in Materials Science”
  

• IS2+SS In Situ Spectroscopy/Microscopy – Interfacial Chemistry/Catalysis
  Doron Aurbach, Bar-Ilan University, Israel, "The Use of In Situ Spectro-Electrochemical Tools on the Way to R&D of Rechargeable Li and Mg Batteries"
  
  Stephen Urquhart, University of Saskatchewan, Canada, "X-ray Spectromicroscopy of Organic and Inorganic Nanostructures"
  

• TR2+SS  Surface Science for Tribology
  Scott S. Perry, University of Florida, “Atomic Scale Investigations of Solid Lubricants”

• TF1+EN  ALD/CVD: Energy Applications
  Peter Stair, Northwestern University, "ALD Applications in Heterogeneous Catalysis"
  

• TF2  ALD/CVD: Organics and Mechanical Applications
  Victor Bright, University of Colorado at Boulder, "ALD for Nano and Micro Electro-Mechanical Systems"
  

• TF3  ALD/CVD: Semiconductor Processing
  Byung Hun Lee, Gwangju Institute of Science and Technology (GIST), South Korea "ALD High k/Metal Gate Devices: Novel Device Concepts"
  

• TF4  ALD/CVD: Surface Chemistry and Fundamentals
  Nicola Pinna, University of Aveiro, Portugal, "Non-aqueous Sol-Gel Chemistry in Atomic Layer Deposition"
  

• TF5  ALD/CVD: Nanostructures and Magnetic Materials
  Kornelius Nielsch, University of Hamburg, Germany, "Magnetic Nano Objects based on Atomic Layer Deposition: Switching Modes in Nanotubes and Core-Shell Nanowires"
  

• TF6  Thin Films: Growth and Characterization
  Daniel Gaspar, Pacific Northwest National Laboratory, "Growth and Characterization of Thin Films for Organic Electronics Applications"
  

• TF7  Thin Films: Multifunctional Materials
  Sergei Kalinin, Oak Ridge National Laboratory, "Mapping Li-ion Diffusion on the Nanoscale in Thin Film Battery Materials"
  

• TF8  Modeling and Analysis of Thin Films
  Charles Musgrave, University of Colorado at Boulder, "Modeling the Surface Chemistry of Molecular Layer Deposition"
  

• TF9  Nanostructuring Thin Films
  Kannan Krishnan, University of Washington, "Nanostructured Thin Film Heterostructures"
  

• TF10   Thin Films: Nonvolatile Memories
  David Abraham, IBM, "MRAM: A Practical Application of Spintronics"
  
  Claudia Wiemer, CNR-INFM, Italy, "Phase Change Materials for Random Access Memories: Deposition, Characterization and Performance"
  

• TF11+EM  Next Generation Processing
  Rudi Hendel, Periodic Structures, Inc., "Moore's Law - from Simple Scaling to Materials Driven"
  

• TF12+EM  Control of Interfacial Properties
  Peide (Peter) Ye, Purdue University, "High-k III-V MOSFETs Enabled by Atomic Layer Deposition"
  

• TF13+SE  Glancing Angle Deposition (GLAD)
  Melik Demirel, Penn State University
  

• TF14   Thin Film Division Poster Session
  

• AC1+TF  Actinide and Rare Earth Thin Films
  Thomas Gouder, Institute for TranUranics (ITU), Germany, "5f Localization in Ultrathin Pu Layers"
  

• EL1+AS+EM+MS+TF  Spectroscopic Ellipsometry I
  Mathias Schubert, University of Nebraska, Lincoln, "New Developments in Spectroscopic Ellipsometry for Characterization of Organic and Inorganic Surfaces, Interfaces and Complex Layered Materials"
  

• EL2+AS+EM+MS+TF  Spectroscopic Ellipsometry II
  Herbert Wormeester, University of Twente, The Netherlands, "Roughness beyond Bruggeman's Effective Medium Approximation"
  

• EL3+AS+EM+MI+MS+TF  Spectroscopic Ellipsometry III
  

• EL4+AS+EM+MS+TF  Spectroscopic Ellipsometry Focus Topic Poster Session
  

• EN2+TF  Thin Films for Photovoltaics
  David Ginley, National Renewable Energy Laboratory
  Paul Holloway, University of Florida
  

• EN3+TF  CIGS, CZTS and Chalcopyrite Films & Solar Cells
  Hugh Hillhouse, Purdue University, "CIGS and CZTS Nanocrystal-Ink Solar Cells”
  

• GR1+TF  Graphene and 2D Nanostructures
  Avik Ghosh, University of Virginia, "Carbon Based Electronics: From Modeling Electron and Thermal Flow to Device and Circuit Design"
  
  Mark Hersam, Northwestern University, "Tailoring the Structure and Properties of Graphene Through Chemical Functionalization"
  

• GR2+TF  Characterization, Properties, and Applications
  Yong Chen, Purdue University, "Electronic Properties of Graphene Synthesized by Chemical Vapor Deposition"
  

• GR3+SS+TF  Epitaxial Graphene on SiC
  Thomas Seyller, The University of Erlangen-Nürnberg, Germany, "Epitaxial Graphene on SiC"
  

• GR4+EM+MS+TF  Graphene and Carbon-based Devices
  Emanuel Tutuc, University of Texas, Austin, “Electron Transport in Dual-Gated Mono- and Bilayer Graphene Devices with High-k Dielectrics”
  

• GR5+MI+TF  Spins in Graphene: Injection and Manipulation
  Joaquin Fernandez-Rossier, Universidad de Alicante, Spain, "Spintronics in Graphene Based Nanostructures"
  
  Oleg Yazyev, University of California, Berkeley, "Imperfect Graphene: Point Defects, Edges, Dislocations and Grain Boundaries"
  

• GR6+AS+TF  Graphene: Surface Characterization
  Regis Decker, University of California Berkeley, "Local Probe Investigation of Transition Metal Atoms on a Gated Graphene Device"
  

• GR7+AS+TF  Graphene Synthesis on Metals
  Thomas Michely, University of Cologne, Germany, "From Perfect Graphene to Cluster Superlattices"
  
  Peter Sutter, Brookhaven National Laboratory, "Transition Metal Catalyzed Graphene"
  

• MI6+TF  Magnetic Nanostructures, Thin Films and Heterostructure
  June Lao, National Institute of Standards and Technology
  

• PS7+TF  Plasma Deposition and Plasma Enhanced ALD
  Jeon Han, SungKyunkwan University, South Korea
  

• SE3+TF  Glancing Angle Deposition (GLAD)
  Daniel Gall, Rensselaer Polytechnic Institute “Nanorods by Extreme Shadowing: New Pictures and New Physics”