AVS 56th International Symposium

Welcome to San Jose and to the AVS-56 International Symposium and Exhibition. We are excited about your participation and your technical contributions to this year’s symposium on topics ranging from fundamental materials and surface science to materials characterization, interfacial phenomena, surface engineering, micro/nano-electronics, nano-science and technology, materials processing and equipment, MEMS/NEMS processing and applications. This year’s program consists of 126 oral and 2 poster sessions sponsored by the 10 AVS Divisions and 2 Technical Groups as well as 3 Topical Conferences and 3 Focus Topics. We’d like to particularly highlight the:

• Photovoltaics Topical Conference

• Energy Frontiers Research Centers Special Sessions

• Plenary Talk by Dave Eaglesham on Thin Film Photovoltaics

• Graphene Topical Conference

• Inkjet Topical Conference

• Plasma Challenges at the 22nm Node and Beyond Special Session

• History Session: 100 years of Vacuum Tube and Radio Broadcast

• Welcome Mixer and the Awards Ceremony and Reception

• Equipment Exhibit which will showcase products from over 150 companies

• AVS/AIP Forum on Photovoltaic Research and Commercialization

• Co-located International Conference on Nanoimprint and Nanoprint Technology (NNT’09) Intellectual Property Workshops

• Career Services Center and Job Information Forum

Thank you for your participation and contribution to this year’s AVS Symposium and thanks to all the dedicated volunteers and the outstanding AVS staff who have invested many hours of work to create this exciting program. Please enjoy the exciting technical presentations and the opportunities for stimulating interactions.

Program Chairs

AVS